Assignee
FIOLKA DAMIAN
DE·23 granted patents·4 pending applications·179 citations·filing 2005–2012
Top patents by PatentIndex Score
27 records- 0197US8279524B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2005·Granted Oct 2, 2012·33 cites·16 claims
- 0295US8289623B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2010·Granted Oct 16, 2012·19 cites·26 claims
- 0394US8259393B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2009·Granted Sep 4, 2012·34 cites·17 claims
- 0493US8320043B2Illumination apparatus for microlithographyprojection system including polarization-modulating optical elementFIOLKA DAMIAN·Filed 2008·Granted Nov 27, 2012·21 cites·20 claims
- 0592US8587767B2Illumination optics for EUV microlithography and related system and apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 19, 2013·12 cites·22 claims
- 0690US8270077B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2006·Granted Sep 18, 2012·20 cites·18 claims
- 0788US9304405B2Microlithography illumination system and microlithography illumination optical unitFIOLKA DAMIAN·Filed 2010·Granted Apr 5, 2016·5 cites·13 claims
- 0888US8482717B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2008·Granted Jul 9, 2013·11 cites·24 claims
- 0977US8542356B2Measurement method and measurement system for measuring birefringenceFIOLKA DAMIAN·Filed 2011·Granted Sep 24, 2013·5 cites·20 claims
- 1077US8077289B2Device and method for influencing the polarization distribution in an optical systemFIOLKA DAMIAN·Filed 2008·Granted Dec 13, 2011·7 cites·30 claims
- 1176US9013680B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Apr 21, 2015·2 cites·22 claims
- 1274US8264668B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2009·Granted Sep 11, 2012·5 cites·16 claims
- 1373US8928859B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2012·Granted Jan 6, 2015·2 cites·20 claims
- 1467US8395753B2Microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Mar 12, 2013·1 cites·24 claims
- 1563US8964162B2Optical assemblyFIOLKA DAMIAN·Filed 2011·Granted Feb 24, 2015·1 cites·42 claims
- 1658US9235137B2Illumination optical unit for microlithographyFIOLKA DAMIAN·Filed 2012·Granted Jan 12, 2016·1 cites·23 claims
- 1752US8861084B2Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2008·Granted Oct 14, 2014·0 cites·39 claims
- 1852US8730455B2Illumination system for a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2011·Granted May 20, 2014·0 cites·10 claims
- 1951US2007014504A1Illumination system of a microlithographic projection exposure apparatus, and depolarizerFIOLKA DAMIAN·Filed 2006·Application pending·0 cites
- 2049US2007019179A1Polarization-modulating optical elementFIOLKA DAMIAN·Filed 2006·Application pending·0 cites
- 2148US9316920B2Illumination system of a microlithographic projection exposure apparatus with a birefringent elementFIOLKA DAMIAN·Filed 2010·Granted Apr 19, 2016·0 cites·27 claims
- 2247US8081293B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2008·Granted Dec 20, 2011·0 cites·20 claims
- 2342US8319945B2Illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Nov 27, 2012·0 cites·20 claims
- 2442US2012287414A1Facet mirror for use in microlithographyFIOLKA DAMIAN·Filed 2012·Application pending·0 cites
- 2541US9128389B2Method for modifying a polarization distribution in microlithographic projection exposure apparatus, and microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2011·Granted Sep 8, 2015·0 cites·35 claims
- 2640US8625071B2Optical system and method for characterising an optical systemFIOLKA DAMIAN·Filed 2010·Granted Jan 7, 2014·0 cites·37 claims
- 2740US2005237623A1Optical unit for an illumination system of a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2005·Application pending·0 cites
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