Assignee
EPSILON TECHN INC
US·18 granted patents·2,550 citations·filing 1987–1992
Top patents by PatentIndex Score
18 records- 0199US5221556AGas injectors for reaction chambers in CVD systemsEPSILON TECHN INC·Filed 1987·Granted Jun 22, 1993·755 cites·9 claims
- 0298US4828224AChemical vapor deposition systemEPSILON TECHN INC·Filed 1987·Granted May 9, 1989·557 cites·2 claims
- 0397US5198034ARotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipmentEPSILON TECHN INC·Filed 1991·Granted Mar 30, 1993·279 cites·16 claims
- 0497US4836138AHeating system for reaction chamber of chemical vapor deposition equipmentEPSILON TECHN INC·Filed 1987·Granted Jun 6, 1989·166 cites·37 claims
- 0595US4846102AReaction chambers for CVD systemsEPSILON TECHN INC·Filed 1987·Granted Jul 11, 1989·97 cites·39 claims
- 0694US4975561AHeating system for substratesEPSILON TECHN INC·Filed 1989·Granted Dec 4, 1990·98 cites·34 claims
- 0793US5080549AWafer handling system with Bernoulli pick-upEPSILON TECHN INC·Filed 1990·Granted Jan 14, 1992·170 cites·14 claims
- 0893US5020475ASubstrate handling and transporting apparatusEPSILON TECHN INC·Filed 1989·Granted Jun 4, 1991·64 cites·40 claims
- 0990US5092728ASubstrate loading apparatus for a CVD processEPSILON TECHN INC·Filed 1989·Granted Mar 3, 1992·51 cites·7 claims
- 1078US5156521AMethod for loading a substrate into a GVD apparatusEPSILON TECHN INC·Filed 1991·Granted Oct 20, 1992·30 cites·13 claims
- 1178US4813732AApparatus and method for automated wafer handlingEPSILON TECHN INC·Filed 1987·Granted Mar 21, 1989·90 cites·10 claims
- 1276US5096534AMethod for improving the reactant gas flow in a reaction chamberEPSILON TECHN INC·Filed 1989·Granted Mar 17, 1992·24 cites·3 claims
- 1375US5261960AReaction chambers for CVD systemsEPSILON TECHN INC·Filed 1992·Granted Nov 16, 1993·26 cites·8 claims
- 1471US5117769ADrive shaft apparatus for a susceptorEPSILON TECHN INC·Filed 1990·Granted Jun 2, 1992·53 cites·13 claims
- 1570US4996942ARotatable substrate supporting susceptor with temperature sensorsEPSILON TECHN INC·Filed 1989·Granted Mar 5, 1991·36 cites·56 claims
- 1661US5044315AApparatus for improving the reactant gas flow in a reaction chamberEPSILON TECHN INC·Filed 1990·Granted Sep 3, 1991·15 cites·10 claims
- 1758US5318634ASubstrate supporting apparatusEPSILON TECHN INC·Filed 1991·Granted Jun 7, 1994·26 cites·14 claims
- 1845US4993355ASusceptor with temperature sensing deviceEPSILON TECHN INC·Filed 1989·Granted Feb 19, 1991·13 cites·6 claims
Join the waitlist — get patent alerts
Get an alert when EPSILON TECHN INC files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →