Assignee
Cymer LLC
US·124 granted patents·43 pending applications·276 citations·filing 2013–2025
Top patents by PatentIndex Score
167 records- 0196US9989866B2Wafer-based light source parameter controlCymer LLC·Filed 2016·Granted Jun 5, 2018·18 cites·50 claims
- 0295US8872144B1System and method for laser beam focus control for extreme ultraviolet laser produced plasma sourceCymer LLC·Filed 2013·Granted Oct 28, 2014·18 cites·13 claims
- 0395US8809823B1System and method for controlling droplet timing and steering in an LPP EUV light sourceCymer LLC·Filed 2013·Granted Aug 19, 2014·22 cites·14 claims
- 0494US8847183B2System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirrorCymer LLC·Filed 2013·Granted Sep 30, 2014·6 cites·19 claims
- 0593US9835959B1Controlling for wafer stage vibrationCymer LLC·Filed 2016·Granted Dec 5, 2017·7 cites·22 claims
- 0693US9634455B1Gas optimization in a gas discharge light sourceCymer LLC·Filed 2016·Granted Apr 25, 2017·9 cites·24 claims
- 0793US9130337B1System and method for automatic gas optimization in a two-chamber gas discharge laser systemCymer LLC·Filed 2014·Granted Sep 8, 2015·16 cites·20 claims
- 0892US8927952B2Target for laser produced plasma extreme ultraviolet light sourceCymer LLC·Filed 2014·Granted Jan 6, 2015·6 cites·21 claims
- 0991US9715180B2Wafer-based light source parameter controlCymer LLC·Filed 2014·Granted Jul 25, 2017·9 cites·30 claims
- 1091US8958143B2Master oscillator—power amplifier drive laser with pre-pulse for EUV light sourceCymer LLC·Filed 2014·Granted Feb 17, 2015·8 cites·19 claims
- 1191US8901523B1Apparatus for protecting EUV optical elementsCymer LLC·Filed 2013·Granted Dec 2, 2014·13 cites·32 claims
- 1290US9599510B2Estimation of spectral feature of pulsed light beamCymer LLC·Filed 2014·Granted Mar 21, 2017·6 cites·29 claims
- 1390US9207119B2Active spectral control during spectrum synthesisCymer LLC·Filed 2013·Granted Dec 8, 2015·11 cites·27 claims
- 1489US10451890B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2017·Granted Oct 22, 2019·3 cites·42 claims
- 1589US9541840B2Faceted EUV optical elementCymer LLC·Filed 2014·Granted Jan 10, 2017·4 cites·20 claims
- 1689US9390827B2EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periodsCymer LLC·Filed 2014·Granted Jul 12, 2016·7 cites·20 claims
- 1787US11054665B2Reducing speckle in an excimer light sourceCymer LLC·Filed 2019·Granted Jul 6, 2021·3 cites·21 claims
- 1887US9983060B1Calibration of a spectral analysis moduleCymer LLC·Filed 2016·Granted May 29, 2018·12 cites·25 claims
- 1987US9819136B2Gas mixture control in a gas discharge light sourceCymer LLC·Filed 2016·Granted Nov 14, 2017·5 cites·37 claims
- 2086US9997888B2Control of a spectral feature of a pulsed light beamCymer LLC·Filed 2016·Granted Jun 12, 2018·5 cites·21 claims
- 2186US9261794B1Compensation for a disturbance in an optical sourceCymer LLC·Filed 2014·Granted Feb 16, 2016·9 cites·31 claims
- 2286US9119278B2System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light outputCymer LLC·Filed 2013·Granted Aug 25, 2015·8 cites·18 claims
- 2385US9301382B2Apparatus for and method of source material delivery in a laser produced plasma EUV light sourceCymer LLC·Filed 2013·Granted Mar 29, 2016·6 cites·20 claims
- 2485US2025013066A1Spectral feature control apparatusCymer LLC·Filed 2024·Application pending·0 cites
- 2584US10095118B2Lithography optics adjustment and monitoringCymer LLC·Filed 2016·Granted Oct 9, 2018·4 cites·19 claims
- 2684US2025062582A1Series of stacked confocal pulse stretchers for speckle reductionCymer LLC·Filed 2024·Application pending·0 cites
- 2783US9271381B2Methods and apparatus for laser produced plasma EUV light sourceCymer LLC·Filed 2014·Granted Feb 23, 2016·6 cites·21 claims
- 2882US12244116B2Apparatus for and method of optical component alignmentCymer LLC·Filed 2023·Granted Mar 4, 2025·0 cites·14 claims
- 2982US11526083B2Spectral feature selection and pulse timing control of a pulsed light beamCymer LLC·Filed 2019·Granted Dec 13, 2022·2 cites·33 claims
- 3082US10416566B2Optimization of source and bandwidth for new and existing patterning devicesCymer LLC·Filed 2016·Granted Sep 17, 2019·3 cites·20 claims
- 3182US9778108B2Metrology system and method having a plurality of sensors for estimating a spectral feature of a pulsed light beamCymer LLC·Filed 2015·Granted Oct 3, 2017·3 cites·29 claims
- 3282US2024310736A1Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2024·Application pending·0 cites
- 3381US10416471B2Spectral feature control apparatusCymer LLC·Filed 2016·Granted Sep 17, 2019·2 cites·28 claims
- 3481US9762023B2Online calibration for repetition rate dependent performance variablesCymer LLC·Filed 2015·Granted Sep 12, 2017·3 cites·31 claims
- 3580US12124053B2Spectral feature control apparatusCymer LLC·Filed 2022·Granted Oct 22, 2024·0 cites·20 claims
- 3680USRE45957ERegenerative ring resonatorCymer LLC·Filed 2013·Granted Mar 29, 2016·4 cites·38 claims
- 3779US12001144B2Forming multiple aerial images in a single lithography exposure passCymer LLC·Filed 2022·Granted Jun 4, 2024·0 cites·21 claims
- 3879US10288484B2Homogenization of light beam for spectral feature metrologyCymer LLC·Filed 2018·Granted May 14, 2019·2 cites·23 claims
- 3979US10228322B2Apparatus for and method of sensing fluorine concentrationCymer LLC·Filed 2017·Granted Mar 12, 2019·1 cites·1 claims
- 4079US2026005484A1Apparatus for and method of modulating a light source wavelengthCymer LLC·Filed 2025·Application pending·0 cites
- 4178US12529962B2Method of compensating wavelength error induced by repetition rate deviationCymer LLC·Filed 2023·Granted Jan 20, 2026·0 cites·20 claims
- 4278US9939732B2Controller for an optical systemCymer LLC·Filed 2015·Granted Apr 10, 2018·2 cites·34 claims
- 4377US11768438B2Spectral feature selection and pulse timing control of a pulsed light beamCymer LLC·Filed 2022·Granted Sep 26, 2023·0 cites·20 claims
- 4477US10288483B2Recovering spectral shape from spatial outputCymer LLC·Filed 2017·Granted May 14, 2019·2 cites·28 claims
- 4577US8748854B2Laser produced plasma EUV light sourceCymer LLC·Filed 2013·Granted Jun 10, 2014·3 cites·11 claims
- 4676US11803126B2Method of compensating wavelength error induced by repetition rate deviationCymer LLC·Filed 2020·Granted Oct 31, 2023·1 cites·18 claims
- 4776US11799261B2Apparatus for and method of optical component alignmentCymer LLC·Filed 2021·Granted Oct 24, 2023·0 cites·22 claims
- 4876US10096969B1Method for dither free adaptive and robust dose control for photolithographyCymer LLC·Filed 2017·Granted Oct 9, 2018·2 cites·9 claims
- 4976US9966725B1Pulsed light beam spectral feature controlCymer LLC·Filed 2017·Granted May 8, 2018·4 cites·25 claims
- 5076US2025286337A1Conduit system, radiation source, lithographic apparatus, and methods thereofCymer LLC·Filed 2025·Application pending·0 cites
Showing the top 50 of 167 patent records by PatentIndex Score.
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