Assignee
CMC MAT LLC
US·2 granted patents·10 pending applications·0 citations·filing 2023–2025
Top patents by PatentIndex Score
12 records- 0180US2024238937A1Chemical mechanical planarization pads with constant groove volumeCMC MAT LLC·Filed 2024·Application pending·0 cites
- 0267US12466979B2CMP composition including anionic and cationic inhibitorsCMC MAT LLC·Filed 2024·Granted Nov 11, 2025·0 cites·4 claims
- 0365US2025270421A1Surface coated abrasive particles for tungsten buff applicationsCMC MAT LLC·Filed 2025·Application pending·0 cites
- 0464US2024101865A1Tungsten cmp composition including a sulfur containing anionic surfactantCMC MAT LLC·Filed 2023·Application pending·0 cites
- 0562US2023406984A1Uv-curable resins for chemical mechanical polishing padsCMC MAT LLC·Filed 2023·Application pending·0 cites
- 0660US12338369B2Nitride inhibitors for high selectivity of TiN—SiN CMP applicationsCMC MAT LLC·Filed 2024·Granted Jun 24, 2025·0 cites·13 claims
- 0760US2023405765A1Dual-cure resin for preparing chemical mechanical polishing padsCMC MAT LLC·Filed 2023·Application pending·0 cites
- 0858US2025277134A1Silane modification of ceria nanoparticles in colloidally stable solutionsCMC MAT LLC·Filed 2025·Application pending·0 cites
- 0952US2024376238A1Dual-cure resin for preparing chemical mechanical polishing padsCMC MAT LLC·Filed 2024·Application pending·0 cites
- 1049US2025277135A1Silane modification of ceria nanoparticles in colloidally stable solutionsCMC MAT LLC·Filed 2025·Application pending·0 cites
- 1145US2024100648A1Chemical mechanical polishing pads with a disulfide bridgeCMC MAT LLC·Filed 2023·Application pending·0 cites
- 1244US2024117220A1Chemical-mechanical polishing composition for heavily-doped boron silicon filmsCMC MAT LLC·Filed 2023·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →