Assignee
CMC MAT INC
US·13 granted patents·15 pending applications·1 citations·filing 2020–2023
Top patents by PatentIndex Score
28 records- 0191US11807710B2UV-curable resins used for chemical mechanical polishing padsCMC MAT INC·Filed 2021·Granted Nov 7, 2023·1 cites·18 claims
- 0276US2023166380A1Endpoint window with controlled texture surfaceCMC MAT INC·Filed 2023·Application pending·0 cites
- 0371US2022234167A1Endpoint window with controlled texture surfaceCMC MAT INC·Filed 2022·Application pending·0 cites
- 0467US12398293B2Composition and method for polishing boron doped polysiliconCMC MAT INC·Filed 2022·Granted Aug 26, 2025·0 cites·7 claims
- 0566US2023323158A1Dual additive polishing composition for glass substratesCMC MAT INC·Filed 2023·Application pending·0 cites
- 0665US12459076B2Chemical-mechanical polishing subpad having porogens with polymeric shellsCMC MAT INC·Filed 2021·Granted Nov 4, 2025·0 cites·8 claims
- 0765US2023059396A1Composition and method for cobalt cmpCMC MAT INC·Filed 2022·Application pending·0 cites
- 0862US12472602B2Textured CMP pad comprising polymer particlesCMC MAT INC·Filed 2022·Granted Nov 18, 2025·0 cites·13 claims
- 0959US12528973B2Composition and method for silicon oxide and carbon doped silicon oxide CMPCMC MAT INC·Filed 2020·Granted Jan 20, 2026·0 cites·16 claims
- 1058US12428580B2CMP composition including an anionic abrasiveCMC MAT INC·Filed 2022·Granted Sep 30, 2025·0 cites·28 claims
- 1158US12234382B2CMP composition including anionic and cationic inhibitorsCMC MAT INC·Filed 2021·Granted Feb 25, 2025·0 cites·13 claims
- 1255US11802220B2Silica-based slurry for selective polishing of carbon-based filmsCMC MAT INC·Filed 2021·Granted Oct 31, 2023·0 cites·9 claims
- 1355US11492514B2Derivatized polyamino acidsCMC MAT INC·Filed 2020·Granted Nov 8, 2022·0 cites·29 claims
- 1455US2021115298A1Composition and method for dielectric cmpCMC MAT INC·Filed 2020·Application pending·0 cites
- 1555US2021115299A1Composition and method for dielectric cmpCMC MAT INC·Filed 2020·Application pending·0 cites
- 1655US2022203497A1Chemical-mechanical polishing pad with textured platen adhesiveCMC MAT INC·Filed 2020·Application pending·0 cites
- 1754US11725116B2CMP composition including a novel abrasiveCMC MAT INC·Filed 2021·Granted Aug 15, 2023·0 cites·32 claims
- 1854US2023090077A1Chemical mechanical planarization pad with a release liner comprising a pull tabCMC MAT INC·Filed 2021·Application pending·0 cites
- 1953US12269969B2Polishing composition and method with high selectivity for silicon nitride and polysilicon over silicon oxideCMC MAT INC·Filed 2020·Granted Apr 8, 2025·0 cites·8 claims
- 2052US12116502B2Self-stopping polishing composition and method for high topological selectivityCMC MAT INC·Filed 2021·Granted Oct 15, 2024·0 cites·25 claims
- 2150US11629271B2Titanium dioxide containing ruthenium chemical mechanical polishing slurryCMC MAT INC·Filed 2021·Granted Apr 18, 2023·0 cites·21 claims
- 2249US2022243094A1Silicon carbonitride polishing composition and methodCMC MAT INC·Filed 2022·Application pending·0 cites
- 2348US2023087984A1Silica-based slurry compositions containing high molecular weight polymers for use in cmp of dielectricsCMC MAT INC·Filed 2022·Application pending·0 cites
- 2447US2023242790A1Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitride, and polysiliconCMC MAT INC·Filed 2022·Application pending·0 cites
- 2547US2023242791A1Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitride, and polysiliconCMC MAT INC·Filed 2022·Application pending·0 cites
- 2646US2022017781A1Silicon wafer polishing composition and methodCMC MAT INC·Filed 2021·Application pending·0 cites
- 2744US2021115301A1Self-stopping polishing composition and methodCMC MAT INC·Filed 2020·Application pending·0 cites
- 2843US2021115302A1Composition and method for selective oxide cmpCMC MAT INC·Filed 2020·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →