Assignee
CHUNG WOONG JAE
US·5 granted patents·19 citations·filing 2008–2012
Top patents by PatentIndex Score
5 records- 0181US8260449B2Photolithography systems and associated methods of overlay error correctionCHUNG WOONG JAE·Filed 2008·Granted Sep 4, 2012·7 cites·20 claims
- 0280US8313877B2Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring markCHUNG WOONG JAE·Filed 2009·Granted Nov 20, 2012·7 cites·27 claims
- 0364US9195149B2Photolithography systems and associated methods of overlay error correctionCHUNG WOONG JAE·Filed 2012·Granted Nov 24, 2015·1 cites·20 claims
- 0464US9052604B2Photolithography systems and associated alignment correction methodsCHUNG WOONG JAE·Filed 2008·Granted Jun 9, 2015·2 cites·15 claims
- 0563US8203695B2Photolithography systems and associated methods of focus correctionCHUNG WOONG JAE·Filed 2008·Granted Jun 19, 2012·2 cites·14 claims
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