Assignee
CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD
CN·8 granted patents·1 pending application·15 citations·filing 2014–2022
Top patents by PatentIndex Score
9 records- 0192US9637444B2Bisoxime ester photoinitiator and preparation method and use thereofCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2015·Granted May 2, 2017·13 cites·10 claims
- 0283US11746085B2Triphenylsulfonium salt compound, and uses thereofCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2019·Granted Sep 5, 2023·2 cites·20 claims
- 0365US12545655B2Method for synthesizing oxetane compound by microreactorCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2021·Granted Feb 10, 2026·0 cites·15 claims
- 0463US2024199805A1Oxetane polymer, preparation method therefor and application thereof, and energy curable compositionCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2022·Application pending·0 cites
- 0550US9815823B2Carbazole ketoxime ester high-photosensitivity photoinitiatorCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2014·Granted Nov 14, 2017·0 cites·6 claims
- 0647US11054743B2Fluorene polyfunctional photoinitiator and preparation and use thereof, and photosensitive resin composition containing fluorene photoinitiator and use thereofCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2016·Granted Jul 6, 2021·0 cites·4 claims
- 0743US10976660B2Fluorene photoinitiator, preparation method therefor, photocurable composition having same, and use of same in photocuring fieldCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2019·Granted Apr 13, 2021·0 cites·18 claims
- 0842US10642155B2Mixed-type photosensitive resin and preparation method thereforCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2019·Granted May 5, 2020·0 cites·12 claims
- 0937US11118065B2Fluorenylaminoketone photoinitiator, preparation method thereof, and UV photocurable composition containing sameCHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD·Filed 2018·Granted Sep 14, 2021·0 cites·19 claims
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