Assignee
SURFX TECH LLC
US·7 granted patents·7 pending applications·94 citations·filing 2014–2025
Top patents by PatentIndex Score
14 records- 0197US10032609B1Low temperature atmospheric pressure plasma applicationsSURFX TECH LLC·Filed 2016·Granted Jul 24, 2018·18 cites·15 claims
- 0296US9406485B1Argon and helium plasma apparatus and methodsSURFX TECH LLC·Filed 2014·Granted Aug 2, 2016·47 cites·23 claims
- 0395US10800092B1Low temperature atmospheric pressure plasma for cleaning and activating metalsSURFX TECH LLC·Filed 2018·Granted Oct 13, 2020·15 cites·20 claims
- 0493US10827601B1Handheld plasma deviceSURFX TECH LLC·Filed 2017·Granted Nov 3, 2020·13 cites·18 claims
- 0580US12120809B1Handheld plasma device processSURFX TECH LLC·Filed 2020·Granted Oct 15, 2024·1 cites·19 claims
- 0672US2026094791A1Removing metal oxide from metallic contacts on substrates, dies and wafers with atmospheric pressure plasmaSURFX TECH LLC·Filed 2025·Application pending·0 cites
- 0765US12408256B1Plasma cleaning device and processSURFX TECH LLC·Filed 2021·Granted Sep 2, 2025·0 cites·10 claims
- 0864US2025353046A1Modifying surfaces with an atmospheric pressure plasmaSURFX TECH LLC·Filed 2024·Application pending·0 cites
- 0963US11518082B1Low temperature atmospheric pressure plasma for cleaning and activating metalsSURFX TECH LLC·Filed 2020·Granted Dec 6, 2022·0 cites·10 claims
- 1062US2026051467A1Mixed gas atmospheric pressure plasmaSURFX TECH LLC·Filed 2024·Application pending·0 cites
- 1159US2025300620A1Systems and methods for impedance matching in plasma creation at atmospheric pressureSURFX TECH LLC·Filed 2024·Application pending·0 cites
- 1259US2025133646A1Hydrogen plasma reduction of metal oxide films to metalSURFX TECH LLC·Filed 2024·Application pending·0 cites
- 1354US2023049702A1Device for plasma treatment of electronic materialsSURFX TECH LLC·Filed 2022·Application pending·0 cites
- 1444US2020152430A1Device and method for plasma treatment of electronic materialsSURFX TECH LLC·Filed 2019·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →