Assignee
SHANGHAI MICROELECTRONICS EQUI
CN·20 granted patents·5 pending applications·16 citations·filing 2006–2017
Top patents by PatentIndex Score
25 records- 0171US10170972B2Halbach array and magnetic suspension damper using sameSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted Jan 1, 2019·2 cites·10 claims
- 0268US7746571B2Large-field unit-magnification projection optical systemSHANGHAI MICROELECTRONICS EQUI·Filed 2006·Granted Jun 29, 2010·5 cites·4 claims
- 0364US9893596B2Magnetic alignment system and alignment method thereforSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted Feb 13, 2018·1 cites·9 claims
- 0463US9755493B2Linear motor and stage apparatusSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Sep 5, 2017·3 cites·18 claims
- 0563US9448488B2Off-axis alignment system and alignment methodSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Sep 20, 2016·1 cites·16 claims
- 0662US9455164B2Laser annealing apparatus and laser annealing methodSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Sep 27, 2016·1 cites·9 claims
- 0756US9752643B2Negative stiffness system for gravity compensation of micropositionerSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Sep 5, 2017·1 cites·3 claims
- 0855US8027028B2Precise positioning system for dual stage switching exposureSHANGHAI MICROELECTRONICS EQUI·Filed 2006·Granted Sep 27, 2011·1 cites·8 claims
- 0953US10276418B2Silicon wafer pre-alignment device and method thereforSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted Apr 30, 2019·1 cites·16 claims
- 1047US9983488B2Reticle shape correction apparatus and photolithography tool using sameSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted May 29, 2018·0 cites·16 claims
- 1146US9588444B2Balance mass system shared by workpiece table and mask table, and lithography machineSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Mar 7, 2017·0 cites·9 claims
- 1242US9857702B2Focusing leveling deviceSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted Jan 2, 2018·0 cites·10 claims
- 1342US2016380524A1Flat voice coil motorSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Application pending·0 cites
- 1441US2015311099A1Wafer Stage Having Function of Anti-CollisionSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Application pending·0 cites
- 1540US9766054B2Planar motor rotor displacement measuring device and its measuring methodSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Sep 19, 2017·0 cites·3 claims
- 1640US9760025B2Reticle shape regulation device and method, and exposure apparatus using sameSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted Sep 12, 2017·0 cites·14 claims
- 1740US9310782B2Method for measuring displacement of planar motor rotorSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Granted Apr 12, 2016·0 cites·3 claims
- 1838US8035801B2Method for in-situ aberration measurement of optical imaging system in lithographic toolsSHANGHAI MICROELECTRONICS EQUI·Filed 2006·Granted Oct 11, 2011·0 cites·14 claims
- 1936US2018195971A1Apparatus and Method for 3D Surface InspectionSHANGHAI MICROELECTRONICS EQUI·Filed 2017·Application pending·0 cites
- 2036US2015357217A1Warped silicon-chip adsorption device and adsorption method thereofSHANGHAI MICROELECTRONICS EQUI·Filed 2013·Application pending·0 cites
- 2135US10041548B2Silicon wafer edge protection device with collision protection functionSHANGHAI MICROELECTRONICS EQUI·Filed 2014·Granted Aug 7, 2018·0 cites·12 claims
- 2232US10197923B2Exposure device and out-of-focus and tilt error compensation methodSHANGHAI MICROELECTRONICS EQUI·Filed 2015·Granted Feb 5, 2019·0 cites·7 claims
- 2331US9760022B2Lithography machine workpiece table and vertical position initialization method thereofSHANGHAI MICROELECTRONICS EQUI·Filed 2015·Granted Sep 12, 2017·0 cites·13 claims
- 2424US10197919B2Adjusting device and adjusting method for exposure deviceSHANGHAI MICROELECTRONICS EQUI·Filed 2015·Granted Feb 5, 2019·0 cites·26 claims
- 2523US2017144251A1Laser annealing deviceSHANGHAI MICROELECTRONICS EQUI·Filed 2015·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →