Assignee
OKUCHI HISASHI
JP·1 granted patent·5 pending applications·0 citations·filing 2009–2012
Top patents by PatentIndex Score
6 records- 0151US8148175B2Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor deviceOKUCHI HISASHI·Filed 2009·Granted Apr 3, 2012·0 cites·12 claims
- 0239US2013061492A1Supercritical drying method and supercritical drying apparatus for semiconductor substrateOKUCHI HISASHI·Filed 2012·Application pending·0 cites
- 0337US2012118334A1Exhaust gas treatment device and method and semiconductor manufacturing systemOKUCHI HISASHI·Filed 2011·Application pending·0 cites
- 0432US2013122706A1Method of manufacturing semiconductor deviceOKUCHI HISASHI·Filed 2012·Application pending·0 cites
- 0531US2011143545A1Apparatus and method of treating surface of semiconductor substrateOKUCHI HISASHI·Filed 2010·Application pending·0 cites
- 0630US2011314689A1Substrate drying methodOKUCHI HISASHI·Filed 2010·Application pending·0 cites
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