Assignee
NOVELLUS SYSTEMS
US·3 granted patents·45 citations·filing 2001–2004
Top patents by PatentIndex Score
3 records- 0184US6846391B1Process for depositing F-doped silica glass in high aspect ratio structuresNOVELLUS SYSTEMS·Filed 2001·Granted Jan 25, 2005·33 cites·35 claims
- 0264US7217398B2Deposition reactor with precursor recycleNOVELLUS SYSTEMS·Filed 2002·Granted May 15, 2007·7 cites·26 claims
- 0357US7043148B1Wafer heating using edge-on illuminationNOVELLUS SYSTEMS·Filed 2004·Granted May 9, 2006·5 cites·20 claims
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