Assignee
MIKAMI MASAKI
JP·4 granted patents·10 citations·filing 2012–2012
Top patents by PatentIndex Score
4 records- 0179US8927179B2Optical member for EUV lithography, and process for production of reflective layer-equipped substrateMIKAMI MASAKI·Filed 2012·Granted Jan 6, 2015·5 cites·20 claims
- 0275US8580465B2Multilayer mirror for EUV lithography and process for its productionMIKAMI MASAKI·Filed 2012·Granted Nov 12, 2013·2 cites·11 claims
- 0374US8993201B2Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrateMIKAMI MASAKI·Filed 2012·Granted Mar 31, 2015·2 cites·20 claims
- 0467US8986910B2Optical member for EUV lithographyMIKAMI MASAKI·Filed 2012·Granted Mar 24, 2015·1 cites·20 claims
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