Assignee
KOKURA HIKARU
JP·3 granted patents·0 citations·filing 2008–2012
Top patents by PatentIndex Score
3 records- 0152US8206550B2Method and system for manufacturing semiconductor device having less variation in electrical characteristicsKOKURA HIKARU·Filed 2009·Granted Jun 26, 2012·0 cites·2 claims
- 0246US8217442B2Semiconductor device and method of manufacturing the sameKOKURA HIKARU·Filed 2008·Granted Jul 10, 2012·0 cites·15 claims
- 0344US8741760B2Method of manufacturing semiconductor device including first conductive pattern and second conductive pattern having top surface which decreases in heightKOKURA HIKARU·Filed 2012·Granted Jun 3, 2014·0 cites·9 claims
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