Assignee
KANEKO HIDEO
JP·2 granted patents·14 citations·filing 1978–2011
Top patents by PatentIndex Score
2 records- 0157US8647795B2Sputtering target material, silicon-containing film forming method, and photomask blankKANEKO HIDEO·Filed 2011·Granted Feb 11, 2014·0 cites·5 claims
- 0257US4424432AElectrode material for travelling-wire type electrical discharge machiningKANEKO HIDEO·Filed 1978·Granted Jan 3, 1984·14 cites·6 claims
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