Assignee
KANDA HIROMI
JP·10 granted patents·57 citations·filing 2006–2012
Top patents by PatentIndex Score
10 records- 0195US8080363B2Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resinKANDA HIROMI·Filed 2008·Granted Dec 20, 2011·26 cites·22 claims
- 0294US8426109B2Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the sameKANDA HIROMI·Filed 2011·Granted Apr 23, 2013·12 cites·14 claims
- 0387US8871421B2Positive resist composition and method of pattern formation with the sameKANDA HIROMI·Filed 2006·Granted Oct 28, 2014·10 cites·66 claims
- 0476US8241833B2Positive resist composition and pattern-forming method using the sameKANDA HIROMI·Filed 2010·Granted Aug 14, 2012·2 cites·8 claims
- 0575US9057952B2Positive resist composition and method of pattern formation with the sameKANDA HIROMI·Filed 2012·Granted Jun 16, 2015·1 cites·34 claims
- 0670US8697329B2Positive resist composition and pattern forming method using the sameKANDA HIROMI·Filed 2008·Granted Apr 15, 2014·2 cites·27 claims
- 0767US10678132B2Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resinKANDA HIROMI·Filed 2008·Granted Jun 9, 2020·2 cites·13 claims
- 0866US8741537B2Positive resist composition and pattern-forming method using the sameKANDA HIROMI·Filed 2006·Granted Jun 3, 2014·2 cites·10 claims
- 0955US8679724B2Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist compositionKANDA HIROMI·Filed 2006·Granted Mar 25, 2014·0 cites·33 claims
- 1049US9442372B2Pigment dispersion composition, photocurable composition and color filterKANDA HIROMI·Filed 2008·Granted Sep 13, 2016·0 cites·14 claims
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