Assignee
JAPAN PROCESS ENGINEERING LTD
JP·2 granted patents·17 citations·filing 1994–1999
Top patents by PatentIndex Score
2 records- 0146US6106628AHeater unit for chemical vapor deposition systemsJAPAN PROCESS ENGINEERING LTD·Filed 1999·Granted Aug 22, 2000·13 cites·5 claims
- 0228US5551965AApparatus for separating and removing a dangerous substance from an exhaust gasJAPAN PROCESS ENGINEERING LTD·Filed 1994·Granted Sep 3, 1996·4 cites·7 claims
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