Assignee
IMADA TOMOYUKI
JP·4 granted patents·4 citations·filing 2010–2012
Top patents by PatentIndex Score
4 records- 0169US8846297B2Positive photoresist composition, coating film thereof, and novolac phenol resinIMADA TOMOYUKI·Filed 2012·Granted Sep 30, 2014·2 cites·20 claims
- 0269US8623585B2Positive-type photoresist compositionIMADA TOMOYUKI·Filed 2011·Granted Jan 7, 2014·2 cites·8 claims
- 0349US8816033B2Radically curable compound, cured product thereof, and method for producing the compoundIMADA TOMOYUKI·Filed 2012·Granted Aug 26, 2014·0 cites·10 claims
- 0446US8946374B2Polyether ester composition, polyurethane resin composition, and optical material using the sameIMADA TOMOYUKI·Filed 2010·Granted Feb 3, 2015·0 cites·14 claims
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