Assignee
HASHIMOTO CHEMICAL IND
JP·11 granted patents·253 citations·filing 1985–1998
Top patents by PatentIndex Score
11 records- 0190US4795582ASurface treating composition for micro processingHASHIMOTO CHEMICAL IND·Filed 1987·Granted Jan 3, 1989·93 cites·6 claims
- 0280US4668497AProcess for purifying hydrogen fluorideHASHIMOTO CHEMICAL IND·Filed 1985·Granted May 26, 1987·27 cites·6 claims
- 0374US5277835ASurface treatment agent for fine surface treatmentHASHIMOTO CHEMICAL IND·Filed 1993·Granted Jan 11, 1994·51 cites·2 claims
- 0468US5073232AMethod of anhydrous hydrogen fluoride etchingHASHIMOTO CHEMICAL IND·Filed 1989·Granted Dec 17, 1991·29 cites·2 claims
- 0565US5100495ADry etching apparatus with diluted anhydrous hydrogen fluoride gas generatorHASHIMOTO CHEMICAL IND·Filed 1991·Granted Mar 31, 1992·33 cites·2 claims
- 0637US5725907AMetal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the materialHASHIMOTO CHEMICAL IND·Filed 1996·Granted Mar 10, 1998·5 cites·2 claims
- 0734US5318706AMethod of supplying dilute hydrofluoric acid and apparatus for use in this method for supplying the acidHASHIMOTO CHEMICAL IND·Filed 1992·Granted Jun 7, 1994·8 cites·3 claims
- 0831US4806332AMethod for preventing anhydrous potassium fluoride from solidificationHASHIMOTO CHEMICAL IND·Filed 1987·Granted Feb 21, 1989·2 cites·3 claims
- 0930US6077561AMetal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the materialHASHIMOTO CHEMICAL IND·Filed 1998·Granted Jun 20, 2000·2 cites·31 claims
- 1030US5605742AMetal material formed with fluorocarbon film, process for preparing the material and apparatus made with use of the materialHASHIMOTO CHEMICAL IND·Filed 1995·Granted Feb 25, 1997·2 cites·3 claims
- 1122US5837323ASurface improving method of polypropylene products for plating, joining or coatingHASHIMOTO CHEMICAL IND·Filed 1995·Granted Nov 17, 1998·1 cites·1 claims
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →