Assignee
GRANIK YURI
US·9 granted patents·4 pending applications·230 citations·filing 2001–2011
Top patents by PatentIndex Score
13 records- 0198US7237221B2Matrix optical process correctionGRANIK YURI·Filed 2005·Granted Jun 26, 2007·80 cites·8 claims
- 0297US7245354B2Source optimization for image fidelity and throughputGRANIK YURI·Filed 2005·Granted Jul 17, 2007·32 cites·19 claims
- 0396US8434031B2Inverse mask design and correction for electronic designGRANIK YURI·Filed 2011·Granted Apr 30, 2013·17 cites·19 claims
- 0496US7487489B2Calculation system for inverse masksGRANIK YURI·Filed 2006·Granted Feb 3, 2009·33 cites·14 claims
- 0595US7623220B2Source optimization for image fidelity and throughputGRANIK YURI·Filed 2007·Granted Nov 24, 2009·21 cites·34 claims
- 0695US7552416B2Calculation system for inverse masksGRANIK YURI·Filed 2007·Granted Jun 23, 2009·24 cites·9 claims
- 0781US7392168B2Method of compensating for etch effects in photolithographic processingGRANIK YURI·Filed 2001·Granted Jun 24, 2008·19 cites·24 claims
- 0874US9323161B2Source optimization by assigning pixel intensities for diffractive optical element using mathematical relationshipGRANIK YURI·Filed 2009·Granted Apr 26, 2016·2 cites·13 claims
- 0968US8464185B2Electron beam simulation corner correction for optical lithographyGRANIK YURI·Filed 2009·Granted Jun 11, 2013·2 cites·16 claims
- 1057US2010269084A1Visibility and Transport Kernels for Variable Etch Bias Modeling of Optical LithographyGRANIK YURI·Filed 2009·Application pending·0 cites
- 1148US2011138343A1Pattern Transfer Modeling for Optical Lithographic ProcessesGRANIK YURI·Filed 2010·Application pending·0 cites
- 1248US2010023915A1Calculation System For Inverse MasksGRANIK YURI·Filed 2009·Application pending·0 cites
- 1348US2011004856A1Inverse Mask Design and Correction for Electronic DesignGRANIK YURI·Filed 2010·Application pending·0 cites
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