Assignee
DING PEIJUN
US·2 granted patents·1 pending application·34 citations·filing 2002–2010
Top patents by PatentIndex Score
3 records- 0192US8668816B2Self-ionized and inductively-coupled plasma for sputtering and resputteringDING PEIJUN·Filed 2007·Granted Mar 11, 2014·19 cites·16 claims
- 0277US8696875B2Self-ionized and inductively-coupled plasma for sputtering and resputteringDING PEIJUN·Filed 2002·Granted Apr 15, 2014·15 cites·61 claims
- 0336US2011220494A1Methods and apparatus for magnetron metallization for semiconductor fabricationDING PEIJUN·Filed 2010·Application pending·0 cites
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