Assignee
ASHTECH IND LLC
US·6 granted patents·8 pending applications·45 citations·filing 2011–2021
Top patents by PatentIndex Score
14 records- 0196US8349444B2Utility materials incorporating a microparticle matrixASHTECH IND LLC·Filed 2011·Granted Jan 8, 2013·24 cites·17 claims
- 0289US10508437B2Utility materials incorporating a microparticle matrix formed with a setting agentASHTECH IND LLC·Filed 2017·Granted Dec 17, 2019·2 cites·18 claims
- 0389US9670665B2Sound attenuation building material and systemASHTECH IND LLC·Filed 2015·Granted Jun 6, 2017·7 cites·13 claims
- 0482US9816266B2Utility materials incorporating a microparticle matrix formed with a setting agentASHTECH IND LLC·Filed 2013·Granted Nov 14, 2017·2 cites·19 claims
- 0578US9076428B2Sound attenuation building material and systemASHTECH IND LLC·Filed 2013·Granted Jul 7, 2015·8 cites·17 claims
- 0677US2022010550A1Utility materials incorporating a microparticle matrix formed with a setting agentASHTECH IND LLC·Filed 2021·Application pending·0 cites
- 0777US2021246655A1Shear panel building materialASHTECH IND LLC·Filed 2021·Application pending·0 cites
- 0876US2020080308A1Shear panel building materialASHTECH IND LLC·Filed 2019·Application pending·0 cites
- 0973US8997924B2Utility materials incorporating a microparticle matrixASHTECH IND LLC·Filed 2013·Granted Apr 7, 2015·2 cites·5 claims
- 1073US2019017268A1Shear panel building materialASHTECH IND LLC·Filed 2018·Application pending·0 cites
- 1157US2014162075A1Shear Panel Building MaterialASHTECH IND LLC·Filed 2013·Application pending·0 cites
- 1256US2017121975A1Shear panel building materialASHTECH IND LLC·Filed 2017·Application pending·0 cites
- 1355US2020080299A1Utility materials incorporating a microparticle matrix formed with a setting agentASHTECH IND LLC·Filed 2019·Application pending·0 cites
- 1451US2014205808A1Utility materials incorporating a microparticle matrix formed with a setting agentASHTECH IND LLC·Filed 2014·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →