US2015137125A1PendingUtilityA1
Semiconductor device
Est. expiryMay 20, 2029(~2.9 yrs left)· nominal 20-yr term from priority
H10W 90/755H10W 90/754H10W 90/734H10W 90/724H10W 74/00H10W 72/9445H10W 72/07533H10W 72/07532H10W 72/5522H10W 72/5449H10W 72/5363H10W 72/983H10W 72/952H10W 72/951H10W 72/932H10W 72/923H10W 72/884H10W 72/536H10W 72/252H10W 72/251H10W 72/075H10W 72/59H10W 72/29H10W 90/701H10W 74/129H10W 70/65H10P 74/273H10W 72/90H01L 2224/0613H01L 22/32H01L 2224/04042H01L 24/06
50
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Claims
Abstract
A technique is provided that can prevent cracking of a protective film in the uppermost layer of a semiconductor device and improve the reliability of the semiconductor device. Bonding pads formed over a principal surface of a semiconductor chip are in a rectangular shape, and an opening is formed in a protective film over each bonding pad in such a manner that an overlapping width of the protective film in a wire bonding region of each bonding pad becomes wider than an overlapping width of the protective film in a probe region of each bonding pad.
Claims
exact text as granted — not AI-modified1 - 18 . (canceled)
19 . A semiconductor device, comprising a semiconductor chip mounted thereon having: a quadrangular power source bonding pad sectioned into a bonding region; and a probe region, wherein:
the power source bonding pad has an upper face with a part exposed across the bonding region and the probe region by two openings in a protective film formed in an upper layer of the power source bonding pad; the bonding region and the probe region of the power source bonding pad are exposed from the two openings respectively; the power source bonding pad has a slit only in the bonding region between the two openings; the protective film is formed by covering a periphery of the power source bonding pad; and an overlapping width of the protective film and the periphery of the power source bonding pad in the bonding region is wider than an overlapping width of the protective film and the periphery of the power source bonding pad in the probe region.Cited by (0)
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