Polishing pad having insulation layer and method for making the same

Abstract

The present invention relates to a polishing pad having an insulation layer and a method for making the same. The polishing pad includes a bottom layer, an insulation layer, and an abrasive layer. The bottom layer includes a fabric layer wrapped in a high polymer. The insulation layer is disposed on the bottom layer. The abrasive layer is disposed on the insulation layer. The abrasive layer is a high polymeric elastomer and has a plurality of columnar-like cells. The insulation layer can prevent the slurry from infiltrating into the bottom layer during the polishing processs to improve the polishing effect and quality.

1 . A polishing pad, comprising:
 a bottom layer, comprising a fabric layer wrapped in a high polymer;   an insulation layer, disposed on the bottom layer; and   an abrasive layer, disposed on the insulation layer, wherein the abrasive layer is a high polymeric elastomer and has a plurality of columnar-like cells.   
     
     
         2 . The polishing pad according to  claim 1 , wherein the fabric layer is a non-woven fabric. 
     
     
         3 . The polishing pad according to  claim 1 , wherein the fabric layer is made of polypropylene (PP), polyethylene terephthalate (PET), nylon, or a mixer thereof. 
     
     
         4 . The polishing pad according to  claim 1 , wherein the high polymer is made of polyurethanes (PU), PP, PET, a high-polymer resin, or a mixer thereof. 
     
     
         5 . The polishing pad according to  claim 1 , wherein the bottom layer has a surface, a fiber portion of the fabric layer is exposed to the surface, and the insulation layer further enwraps the exposed fiber portion. 
     
     
         6 . The polishing pad according to  claim 1 , wherein the insulation layer is coated on the bottom layer. 
     
     
         7 . The polishing pad according to  claim 1 , wherein the insulation layer is made of PU, PP, PET, a high-polymer resin, a thin metal layer, or a metal powder. 
     
     
         8 . The polishing pad according to  claim 1 , wherein the abrasive layer is coated on the insulation layer, and is made of PU, PP, PET, a high-polymer resin, or a mixer thereof. 
     
     
         9 . The polishing pad according to  claim 1 , wherein the columnar-like cells are distributed over a thickness that is at least one half of the overall thickness of the abrasive layer, and the depth of the columnar-like cells is greater than one half of the overall thickness of the abrasive layer. 
     
     
         10 . The polishing pad according to  claim 1 , wherein the polishing pad has a compression ratio of 5% to 50%. 
     
     
         11 . The polishing pad according to  claim 1 , wherein the polishing pad has a recovery ratio greater than 80%. 
     
     
         12 . The polishing pad according to  claim 1 , wherein the fabric layer is made of PET, the high polymer is made of PU, the insulation layer comprises PU and methyl ethyl ketone (MEK), and the abrasive layer is made of PU. 
     
     
         13 . A method for making a polishing pad, comprising:
 (a) providing a bottom layer, wherein the bottom layer comprises a fabric layer wrapped in a high polymer and has a surface;   (b) forming an insulation layer on the surface of the bottom layer;   (c) forming a high polymeric elastomer on the insulation layer;   (d) curing the high polymeric elastomer to form an abrasive layer, wherein the abrasive layer has a plurality of columnar-like cells; and   (e) abrading a surface of the abrasive layer, such that the abrasive layer has a plurality of surface openings.   
     
     
         14 . The method according to  claim 13 , wherein Step (a) comprises:
 (a1) providing a fabric layer;   (a2) immersing the fabric layer in a high-polymer solution, such that the high-polymer solution enwraps the fabric layer; and   (a3) curing the high-polymer solution to form the bottom layer.   
     
     
         15 . The method according to  claim 13 , wherein a fiber portion of the fabric layer in Step (a) is exposed to the surface of the bottom layer and the insulation layer in Step (b) further enwraps the exposed fiber portion. 
     
     
         16 . The method according to  claim 13 , wherein in Step (b), the insulation layer is formed on the bottom layer by coating, roll-printing, or transferring. 
     
     
         17 . The method according to  claim 13 , wherein in Step (c), the high polymeric elastomer is formed on the insulation layer by coating, roll-printing, or transferring. 
     
     
         18 . The method according to  claim 13 , wherein in Step (d), the bottom layer, the insulation layer, and the high polymeric elastomer are immersed in a curing solution, so as to cure the high polymeric elastomer to form an abrasive layer, and generate the columnar-like cells in the abrasive layer. 
     
     
         19 . The method according to  claim 18 , wherein the curing solution comprises dimethylformamide (DMF) and water. 
     
     
         20 . The method according to  claim 13 , wherein in Step (e), the surface of the abrasive layer is abraded, and scraps are removed by vacuum suction.