Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent

Abstract

The invention provides an antistatic treatment agent having an ability of preventing resist film thinning phenomenon in a chemically amplified resist, an antistatic film, a coated article and a pattern forming method using such antistatic treatment agent, in particular, the invention provides an antistatic treatment agent comprising an aqueous solvent-soluble electroconductive polymer, a diamine (divalent) or polyamine (polyvalent) aliphatic basic compound and an anionic surfactant, an antistatic film, a coated article and a pattern forming method using such antistatic treatment agent. As the aqueous solvent-soluble electroconductive polymer, a π-conjugated electroconductive polymer having a Brönsted acid group is a sulfonic acid group is preferred and it is preferable that the amount of the diamine (divalent) or polyamine (polyvalent) aliphatic basic compound be from 0.1 to 75 mol % based on the total number of moles of the basic compounds.

1 - 29 . (canceled) 
   
   
       30 . An antistatic treatment agent comprising an aqueous solvent-soluble electroconductive polymer having a Brönsted acid group and a diamine or polyamine aliphatic basic compound, wherein the aqueous solvent-soluble electroconductive polymer includes a chemical structure represented by formula (3): 
     
       
         
         
             
             
         
       
     
     in the formula, R 5  represents a hydrogen atom, a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, a linear or branched, saturated or unsaturated alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, a halogen atom, a nitro group, a cyano group, a trihalomethyl group, a phenyl group, a substituted phenyl group or a —B—SO 3   − M +  group; B represents —(CH 2 ) p —(O) q —(CH 2 ) r — in which p represents 0 or an integer of 1 to 3, and q and r each independently represents an integer of 1 to 3; and M +  represents a hydrogen ion, an alkali metal ion, or a quaternary ammonium ion. 
   
   
       31 . The antistatic treatment agent as claimed in  claim 30 , wherein the number of moles of the basic group contained in the diamine or polyamine aliphatic basic compound is within a range of 0.05 to 50 mol % based on the number of moles of the Brönsted acid group contained in the aqueous solvent-soluble electroconductive polymer. 
   
   
       32 . The antistatic treatment agent as claimed in  claim 30 , which is an aqueous solution containing 0.1 to 10 mass % of an aqueous solvent-soluble electroconductive polymer, 0.1 to 20 mass % of a diamine or polyamine aliphatic basic compound and 0.1 to 20 mass % of the volatile basic compound, provided that the entire amount of the antistatic treatment agent is 100 mass %. 
   
   
       33 . The antistatic treatment agent as claimed in  claim 30 , further comprising a surfactant. 
   
   
       34 . The antistatic treatment agent as claimed in  claim 33 , wherein the surfactant is an anionic surfactant, an amphoteric surfactant or a mixture thereof. 
   
   
       35 . The antistatic treatment agent as claimed in  claim 33 , wherein the surfactant is an anionic surfactant. 
   
   
       36 . The antistatic treatment agent as claimed in  claim 35 , which is an aqueous solution containing 0.1 to 10 mass % of an aqueous solvent-soluble electroconductive polymer, 0.1 to 20 mass % of a diamine or polyamine aliphatic basic compound, 0.1 to 20 mass % of a volatile basic compound and 0.001 to 1 mass % of an amphoteric surfactant provided that the entire amount of the antistatic treatment agent is 100 mass %. 
   
   
       37 . An antistatic film obtained by using the antistatic treatment agent as described in  claim 30 . 
   
   
       38 . A coated article coated with the antistatic film as claimed in  claim 37 . 
   
   
       39 . A coated article described in  claim 38 , wherein the antistatic film is formed on a photosensitive composition or a charged particle-sensitive composition coated on a base substrate. 
   
   
       40 . The pattern forming method using the antistatic film as claimed in  claim 37 . 
   
   
       41 . An antistatic treatment agent comprising an aqueous solvent-soluble electroconductive polymer having a Brönsted acid group and a diamine or polyamine aliphatic basic compound, wherein the aqueous solvent-soluble electroconductive polymer includes a chemical structure represented by formula (4): 
     
       
         
         
             
             
         
       
     
     in the formula, R 6  to R 8  each independently represents a hydrogen atom, a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, a linear or branched, saturated or unsaturated alkoxy group having 1 to 20 carbon atoms, a hydroxyl group, a halogen atom, a nitro group, a cyano group, a trihalomethyl group, a phenyl group, a substituted phenyl group or a SO 3   − M +  group; R 9  represents a hydrogen atom or a monovalent group selected from a group of a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, a phenyl group and a substituted phenyl group; B represents —(CH 2 ) p —(O) q —(CH 2 ) r — in which p represents 0 or an integer of 1 to 3, and q and r each independently represents an integer of 1 to 3; and M +  represents a hydrogen ion, an alkali metal ion, or a quaternary ammonium ion. 
   
   
       42 . The antistatic treatment agent as claimed in  claim 41 , wherein the number of moles of the basic group contained in the diamine or polyamine aliphatic basic compound is within a range of 0.05 to 50 mol % based on the number of moles of the Brönsted acid group contained in the aqueous solvent-soluble electroconductive polymer. 
   
   
       43 . The antistatic treatment agent as claimed in  claim 41 , which is an aqueous solution containing 0.1 to 10 mass % of an aqueous solvent-soluble electroconductive polymer, 0.1 to 20 mass % of a diamine or polyamine aliphatic basic compound and 0.1 to 20 mass % of the volatile basic compound, provided that the entire amount of the antistatic treatment agent is 100 mass %. 
   
   
       44 . The antistatic treatment agent as claimed in  claim 41 , further comprising a surfactant. 
   
   
       45 . The antistatic treatment agent as claimed in  claim 44 , wherein the surfactant is an anionic surfactant, an amphoteric surfactant or a mixture thereof. 
   
   
       46 . The antistatic treatment agent as claimed in  claim 44 , wherein the surfactant is an anionic surfactant. 
   
   
       47 . The antistatic treatment agent as claimed in  claim 46 , which is an aqueous solution containing 0.1 to 10 mass % of an aqueous solvent-soluble electroconductive polymer, 0.1 to 20 mass % of a diamine or polyamine aliphatic basic compound, 0.1 to 20 mass % of a volatile basic compound and 0.001 to 1 mass % of an amphoteric surfactant provided that the entire amount of the antistatic treatment agent is 100 mass %. 
   
   
       48 . An antistatic film obtained by using the antistatic treatment agent as described in  claim 41 . 
   
   
       49 . A coated article coated with the antistatic film as claimed in  claim 48 . 
   
   
       50 . A coated article described in  claim 49 , wherein the antistatic film is formed on a photosensitive composition or a charged particle-sensitive composition coated on a base substrate. 
   
   
       51 . The pattern forming method using the antistatic film as claimed in  claim 48 .