Cleaning ceramic surfaces

Abstract

Method and apparatus for cleaning ceramic surfaces of parts used, for example, and without limitation, in semiconductor processing equipment. In particular, one embodiment of the present invention is a method for cleaning a ceramic part that includes steps of: (a) treating the surface using one or more first mechanical processes; (b) treating the surface using one or more chemical processes; (c) plasma conditioning the surface; and (d) treating the surface using one or more second mechanical processes.

What is claimed is:  
     
         1 . A method for cleaning a part having a ceramic surface which comprises steps of: 
 treating the surface using one or more first mechanical processes;    treating the surface using one or more chemical processes;    plasma conditioning the surface; and    treating the surface using one or more second mechanical processes.    
     
     
         2 . The method of  claim 1  wherein the step of treating the surface using one or more first mechanical processes includes bead-blasting.  
     
     
         3 . The method of  claim 1  wherein the step of plasma conditioning comprises inductively coupling energy to a plasma in a chamber and exposing the surface to the plasma in the chamber.  
     
     
         4 . The method of  claim 3  which further includes forming the plasma utilizing precursors that include an inert gas.  
     
     
         5 . The method of  claim 4  wherein the inert gas comprises Ar.  
     
     
         6 . The method of  claim 4  wherein the precursors further include a reactive chemical.  
     
     
         7 . The method of  claim 6  wherein the reactive chemical comprises Cl 2 .  
     
     
         8 . The method of  claim 6  wherein the reactive chemical comprises BCl 3 .  
     
     
         9 . The method of  claim 1  wherein the step of plasma conditioning comprises capacitively coupling energy to a plasma in a chamber and exposing the surface to the plasma in the chamber.  
     
     
         10 . The method of  claim 9  wherein the step of exposing comprises disposing the surface in a plasma chamber, and the step of capacitively coupling includes forming the plasma utilizing precursors that include an inert gas.  
     
     
         11 . The method of  claim 10  wherein the inert gas comprises Ar.  
     
     
         12 . The method of  claim 10  wherein the precursors further include a reactive chemical.  
     
     
         13 . The method of  claim 1  wherein the step of plasma conditioning comprises generating a plasma, flowing the plasma into a chamber, and exposing the surface to the plasma in the chamber.  
     
     
         14 . The method of  claim 13  wherein the step of generating includes exposing a gas to microwaves.  
     
     
         15 . The method of  claim 13  wherein the step of generating includes exposing a gas to RF energy.  
     
     
         16 . The method of  claim 1  wherein the step of treating the surface using one or more first mechanical processes comprises steps of: 
 rinsing the surface using pressurized deionized water; and  
 propelling CO 2  pellets against the surface.  
 
     
     
         17 . The method of  claim 1  wherein the step of treating the surface using one or more chemical processes comprises steps of: 
 dipping the part in NH 4 OH:H 2 O 2 :H 2 O; and  
 dipping the part in HF:HNO 3 :H 2 O.  
 
     
     
         18 . The method of  claim 1  wherein the step of treating the surface using one or more second mechanical processes comprises steps of: 
 propelling CO 2  snow against the surface; and  
 ultrasonically cleaning the surface using deionized water.  
 
     
     
         19 . A method for cleaning a part having a ceramic surface which comprises steps of: 
 treating the surface using one or more first mechanical processes;    treating the surface using one or more chemical processes;    exposing the surface to H 2 SO 4 :H 2 O 2 ; and    treating the surface using one or more second mechanical processes.    
     
     
         20 . The method of  claim 19  wherein the step of treating the surface using one or more first mechanical processes includes bead-blasting.  
     
     
         21 . A method for cleaning a part having a ceramic surface which comprises steps of: 
 treating the surface using one or more first mechanical processes;    treating the surface using one or more chemical processes;    exposing the surface to NMD-3; and    treating the surface using one or more second mechanical processes.