Method of manufacturing photopolymer plates

Abstract

A method of manufacturing photopolymer marking structures is disclosed. The improved method results in a substantially tack-free marking structure.

We claim:  
     
         1 . A method of making the surface of a marking structure substantially tack-free, comprising the steps of: 
 providing an at least partially cured marking structure composed of a photopolymer material, said marking structure having at least one surface; and    curing at least said surface of said at least partially cured marking structure while said surface is in contact with a solution including water, at least about 1% of a reducing agent by weight and, at least about 0.01% of a surfactant by weight.    
     
     
         2 . A method of making the surface of a marking structure substantially free from surface tack comprising the steps of: exposing selected portions of a desired amount of a photopolymer material, in an uncured state, to an irradiation source whereby said photopolymer material is partially cured; 
 removing at least a portion of any remaining uncured photopolymer material; and    further curing at least a portion of said partially cured marking structure by exposure to an irradiation source while in contact with a solution including water, at least about 1% of a reducing agent by weight and at least about 0.01% of a surfactant by weight.    
     
     
         3 . The method of  claim 1  wherein said reducing agent comprises a salt.  
     
     
         4 . The method of  claim 1  wherein said reducing agent comprises sodium sulfite.  
     
     
         5 . The method of  claim 1  wherein said surfactant comprises an alcohol sulfate.  
     
     
         6 . The method of  claim 1  wherein said solution comprises between about 70%-99.9% of said water by weight.  
     
     
         7 . The method of  claim 1  further comprising the step of forming said marking structure by exposing selected portions of a desired amount of said photopolymer material in an uncured liquid state to an irradiation source whereby said photopolymer material is partially cured.  
     
     
         8 . The method of  claim 2  wherein said reducing agent comprises a salt.  
     
     
         9 . The method of  claim 2  wherein said reducing agent comprises sodium sulfite.  
     
     
         10 . The method of  claim 2  wherein said surfactant comprises an alcohol sulfate.  
     
     
         11 . The method of  claim 2  wherein said solution comprises between about 70%-99.9% of said water by weight.  
     
     
         12 . The method of claims  1  or  2  wherein said solution includes no more than about 15% by weight of each of said reducing agent and said surfactant.  
     
     
         13 . The method of claims  1  or  2  making the surface of a marking structure substantially tack-free, comprising the steps of: 
 providing an at least partially cured marking structure composed of a photopolymer material, said marking structure having at least one surface; and  
 curing at least said surface of said at least partially cured marking structure while said surface is in contact with a solution including water, between about 1% and about 15% of a reducing agent by weight and between about 1% and about 15% of a surfactant by weight.  
 
     
     
         14 . The method of claims  1  or  2  making the surface of a marking structure substantially free from surface tack comprising the steps of: exposing selected portions of a desired amount of a photopolymer material, in an uncured state, to an irradiation source whereby said photopolymer material is partially cured; 
 removing at least a portion of any remaining uncured photopolymer material; and  
 further curing at least a portion of said partially cured marking structure by exposure to an irradiation source while in contact with a solution including water, between about 1% and about 15% of a reducing agent by weight and between about 1% and about 15% of a surfactant by weight.