Inventor · disambiguated record
Tamara Druzhinina
Also filed as: DRUZHININA TAMARA
11 granted patents·2 pending applications·9 citations·filing 2012–2024
82Inventor score
Files withASML NETHERLANDS BV13
Top patents by PatentIndex Score
13 records- 0185US12500063B2Method and apparatus for inspectionASML NETHERLANDS BV·Filed 2024·Granted Dec 16, 2025·0 cites·20 claims
- 0284US11092902B2Method and apparatus for detecting substrate surface variationsASML NETHERLANDS BV·Filed 2018·Granted Aug 17, 2021·2 cites·14 claims
- 0382US10712656B2Method for manufacturing a membrane assemblyASML NETHERLANDS BV·Filed 2016·Granted Jul 14, 2020·4 cites·21 claims
- 0474US11875966B2Method and apparatus for inspectionASML NETHERLANDS BV·Filed 2021·Granted Jan 16, 2024·0 cites·22 claims
- 0565US10551736B2Methods for providing lithography features on a substrate by self-assembly of block copolymersASML NETHERLANDS BV·Filed 2013·Granted Feb 4, 2020·1 cites·20 claims
- 0664US9368366B2Methods for providing spaced lithography features on a substrate by self-assembly of block copolymersASML NETHERLANDS BV·Filed 2014·Granted Jun 14, 2016·1 cites·17 claims
- 0759US10240250B2Method to provide a patterned orientation template for a self-assemblable polymerASML NETHERLANDS BV·Filed 2012·Granted Mar 26, 2019·1 cites·23 claims
- 0858US11094502B2Method and apparatus for inspectionASML NETHERLANDS BV·Filed 2016·Granted Aug 17, 2021·0 cites·20 claims
- 0957US12399428B2Method and apparatus for forming a patterned layer of materialASML NETHERLANDS BV·Filed 2021·Granted Aug 26, 2025·0 cites·20 claims
- 1047US12325911B2Method and apparatus for forming a patterned layer of materialASML NETHERLANDS BV·Filed 2020·Granted Jun 10, 2025·0 cites·17 claims
- 1140US2020152527A1Clearing out method, revealing device, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 1240US2021079519A1Method and apparatus for forming a patterned layer of materialASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 1336US10127336B2Method of simulating formation of lithography features by self-assembly of block copolymersASML NETHERLANDS BV·Filed 2014·Granted Nov 13, 2018·0 cites·23 claims
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