Inventor · disambiguated record
Souichi Fukaya
Also filed as: FUKAYA SOUICHI
20 granted patents·1 pending application·17 citations·filing 2011–2018
90Inventor score
Top patents by PatentIndex Score
21 records- 0184US9158192B2Half-tone phase shift mask blank and method for manufacturing half-tone phase shift maskSHINETSU CHEMICAL CO·Filed 2013·Granted Oct 13, 2015·4 cites·9 claims
- 0283US10712654B2Photomask blankSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 14, 2020·2 cites·22 claims
- 0381US9268212B2Photomask blank and method for manufacturing photomaskSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 23, 2016·3 cites·16 claims
- 0481US9188852B2Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift maskSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 17, 2015·3 cites·9 claims
- 0579US9488907B2Photomask blank, process for production of photomask, and chromium-containing material filmSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 8, 2016·1 cites·19 claims
- 0675US9440375B2Blank for mold production and method for manufacturing moldSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 13, 2016·2 cites·14 claims
- 0770US9952501B2Photomask blank, making method, and photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Apr 24, 2018·1 cites·14 claims
- 0869US8968972B2Photomask blank, process for production of photomask, and chromium-containing material filmYOSHIKAWA HIROKI·Filed 2011·Granted Mar 3, 2015·1 cites·20 claims
- 0959US10120274B2Method of manufacturing photomask blank and photomask blankSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 6, 2018·0 cites·17 claims
- 1059US9581892B2Method of manufacturing photomask blank and photomask blankSHINETSU CHEMICAL CO·Filed 2014·Granted Feb 28, 2017·0 cites·8 claims
- 1159US2015159264A1Sputter deposition method, sputtering system, manufacture of photomask blank, and photomask blankSHINETSU CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1257US10040220B2Blank for mold production and method for manufacturing moldSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 7, 2018·0 cites·11 claims
- 1354US9541823B2Photomask blankSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 10, 2017·0 cites·24 claims
- 1452US10747098B2Halftone phase shift photomask blankSHINETSU CHEMICAL CO·Filed 2018·Granted Aug 18, 2020·0 cites·6 claims
- 1552US9851633B2Inorganic material film, photomask blank, and method for manufacturing photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Dec 26, 2017·0 cites·9 claims
- 1650US9063427B2Photomask blank and manufacturing method thereofSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 23, 2015·0 cites·10 claims
- 1749US9798229B2Designing of photomask blank and photomask blankSHINETSU CHEMICAL CO·Filed 2015·Granted Oct 24, 2017·0 cites·35 claims
- 1847US9689066B2Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer methodSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 27, 2017·0 cites·9 claims
- 1946US9618838B2Photomask blankSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 11, 2017·0 cites·9 claims
- 2043US9798230B2Photomask blankSHINETSU CHEMICAL CO·Filed 2015·Granted Oct 24, 2017·0 cites·16 claims
- 2141US9880459B2Photomask blank and method for preparing photomaskSHINETSU CHEMICAL CO·Filed 2016·Granted Jan 30, 2018·0 cites·7 claims
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