Inventor · disambiguated record
Ralph Brinkhof
Also filed as: BRINKHOF RALPH
20 granted patents·5 pending applications·74 citations·filing 2003–2024
93Inventor score
Top patents by PatentIndex Score
25 records- 0195US8842293B2Level sensor arrangement for lithographic apparatus and device manufacturing methodDEN BOEF ARIE JEFFREY·Filed 2010·Granted Sep 23, 2014·16 cites·15 claims
- 0294US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0391US12032299B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 9, 2024·2 cites·25 claims
- 0490US10331040B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jun 25, 2019·4 cites·20 claims
- 0589US10620549B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 14, 2020·3 cites·20 claims
- 0685US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 0783US10416577B2Position measuring method of an alignment targetASML NETHERLANDS BV·Filed 2016·Granted Sep 17, 2019·3 cites·20 claims
- 0881US7746484B2Method for positioning a target portion of a substrate with respect to a focal plane of a projection systemASML NETHERLANDS BV·Filed 2007·Granted Jun 29, 2010·7 cites·9 claims
- 0980US10901326B2Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Jan 26, 2021·1 cites·22 claims
- 1079US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 1174US7889357B2Method for positioning a target portion of a substrate with respect to a focal plane of a projection systemASML NETHERLANDS BV·Filed 2010·Granted Feb 15, 2011·2 cites·5 claims
- 1268US7239368B2Using unflatness information of the substrate table or mask table for decreasing overlayASML NETHERLANDS BV·Filed 2004·Granted Jul 3, 2007·10 cites·13 claims
- 1367US7649635B2Method for determining a map, device manufacturing method, and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Jan 19, 2010·2 cites·3 claims
- 1464US2024192610A1Method for modeling measurement data over a substrate area and associated apparatusesASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1562US7113257B2Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·9 cites·30 claims
- 1661US11442372B2Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic toolASML NETHERLANDS BV·Filed 2020·Granted Sep 13, 2022·0 cites·21 claims
- 1760US12189314B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 1856US7292351B2Method for determining a map, device manufacturing method, and lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Nov 6, 2007·4 cites·34 claims
- 1950US2008151204A1Method for positioning a target portion of a substrate with respect to a focal plane of a projection systemASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2049US12276919B2Method for controlling a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Apr 15, 2025·0 cites·20 claims
- 2148US8208118B2Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrierBURRY DAVID WARREN·Filed 2009·Granted Jun 26, 2012·1 cites·12 claims
- 2239US8675210B2Level sensor, lithographic apparatus, and substrate surface positioning methodDEN BOEF ARIE JEFFREY·Filed 2012·Granted Mar 18, 2014·0 cites·9 claims
- 2338US2005134865A1Method for determining a map, device manufacturing method, and lithographic apparatusASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
- 2437US2011109889A1Method for positioning a target portion of a substrate with respect to a focal plane of a projection systemASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
- 2535US2007262268A1Method for imaging a pattern onto a target portion of a substrateASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →