Inventor · disambiguated record
Boris Menchtchikov
Also filed as: MENCHTCHIKOV BORIS
35 granted patents·1 pending application·232 citations·filing 2003–2022
97Inventor score
Files withASML NETHERLANDS BV26MENCHTCHIKOV BORIS4PADIY ALEXANDER VIKTOROVYCH4CADEE THEODORUS PETRUS MARIA2
Top patents by PatentIndex Score
36 records- 0196US7804575B2Lithographic apparatus and device manufacturing method having liquid evaporation controlASML NETHERLANDS BV·Filed 2005·Granted Sep 28, 2010·23 cites·44 claims
- 0295US7304715B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 4, 2007·52 cites·39 claims
- 0394US11378893B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 0494US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0594US9903823B2Metrology method and apparatusASML NETHERLANDS BV·Filed 2015·Granted Feb 27, 2018·10 cites·20 claims
- 0690US11947266B2Method for controlling a manufacturing process and associated apparatusesASML NETHERLANDS BV·Filed 2019·Granted Apr 2, 2024·5 cites·20 claims
- 0790US7462429B2Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrateASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·9 cites·11 claims
- 0889US9188880B2Lithographic apparatus and device manufacturing method involving a heaterCADEE THEODORUS PETRUS MARIA·Filed 2011·Granted Nov 17, 2015·4 cites·32 claims
- 0989US8687167B2Lithographic apparatus and device manufacturing methodPADIY ALEXANDER VIKTOROVYCH·Filed 2011·Granted Apr 1, 2014·7 cites·26 claims
- 1088US9268242B2Lithographic apparatus and device manufacturing method involving a heater and a temperature sensorCADEE THEODORUS PETRUS MARIA·Filed 2010·Granted Feb 23, 2016·4 cites·38 claims
- 1187US12044980B2Method of manufacturing devicesASML NETHERLANDS BV·Filed 2019·Granted Jul 23, 2024·3 cites·20 claims
- 1287US9310698B2Method and apparatus for controlling a lithographic apparatusMENCHTCHIKOV BORIS·Filed 2011·Granted Apr 12, 2016·6 cites·13 claims
- 1387US8947630B2Lithographic apparatus and device manufacturing methodPADIY ALEXANDER VIKTOROVYCH·Filed 2011·Granted Feb 3, 2015·6 cites·27 claims
- 1486US10838310B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2019·Granted Nov 17, 2020·1 cites·20 claims
- 1585US8717536B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productMENCHTCHIKOV BORIS·Filed 2011·Granted May 6, 2014·5 cites·15 claims
- 1685US7710539B2Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor deviceASML NETHERLANDS BV·Filed 2008·Granted May 4, 2010·5 cites·15 claims
- 1785US7595496B2Optimized correction of wafer thermal deformations in a lithographic processASML NETHERLANDS BV·Filed 2007·Granted Sep 29, 2009·7 cites·15 claims
- 1882US11803127B2Method for determining root cause affecting yield in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2019·Granted Oct 31, 2023·3 cites·20 claims
- 1982US7462430B2Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor deviceASML NETHERLANDS BV·Filed 2006·Granted Dec 9, 2008·4 cites·13 claims
- 2082US7250237B2Optimized correction of wafer thermal deformations in a lithographic processASML NETHERLANDS BV·Filed 2003·Granted Jul 31, 2007·19 cites·24 claims
- 2181US7423725B2Lithographic methodASML NETHERLANDS BV·Filed 2006·Granted Sep 9, 2008·5 cites·31 claims
- 2279US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 2379US8947643B2Lithographic apparatus and method controlling parameter drift by performing multiple patterning passes on reference substratePADIY ALEXANDER VIKTOROVYCH·Filed 2011·Granted Feb 3, 2015·3 cites·20 claims
- 2478US7453063B2Calibration substrate and method for calibrating a lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Nov 18, 2008·16 cites·45 claims
- 2574US12055904B2Method to predict yield of a device manufacturing processASML NETHERLANDS BV·Filed 2019·Granted Aug 6, 2024·2 cites·20 claims
- 2674US11086229B2Method to predict yield of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Aug 10, 2021·1 cites·24 claims
- 2773US7710538B2Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrateASML NETHERLANDS BV·Filed 2008·Granted May 4, 2010·2 cites·12 claims
- 2871US7196768B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Mar 27, 2007·14 cites·12 claims
- 2970US11714357B2Method to predict yield of a device manufacturing processASML NETHERLANDS BV·Filed 2021·Granted Aug 1, 2023·0 cites·20 claims
- 3070US9395633B2Lithographic cluster system, method for calibrating a positioning device of a lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jul 19, 2016·2 cites·15 claims
- 3166US8793099B2Calibration of lithographic apparatusMENCHTCHIKOV BORIS·Filed 2011·Granted Jul 29, 2014·1 cites·14 claims
- 3265US9134625B2Lithographic apparatus and device manufacturing method for measuring wafer parameters using non-standard alignment settingsPADIY ALEXANDER VIKTOROVYCH·Filed 2011·Granted Sep 15, 2015·1 cites·21 claims
- 3365US7426011B2Method of calibrating a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 16, 2008·2 cites·25 claims
- 3463US10254663B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2015·Granted Apr 9, 2019·0 cites·38 claims
- 3557US2024184221A1Alignment method and associated alignment and lithographic apparatusesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3648US9069240B2Calibration of lithographic apparatus by exposing patterns on substrate positioned at different orientationsMENCHTCHIKOV BORIS·Filed 2011·Granted Jun 30, 2015·0 cites·9 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →