Inventor · disambiguated record
Yoshinobu Ooya
Also filed as: OHYA YOSHINOBU · OOYA YOSHINOBU
15 granted patents·3 pending applications·389 citations·filing 2004–2021
94Inventor score
Top patents by PatentIndex Score
18 records- 0197US8383001B2Plasma etching method, plasma etching apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2010·Granted Feb 26, 2013·60 cites·16 claims
- 0297US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0396US10410877B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Sep 10, 2019·40 cites·15 claims
- 0496US10381237B2Etching methodTOKYO ELECTRON LTD·Filed 2018·Granted Aug 13, 2019·39 cites·12 claims
- 0596US8641916B2Plasma etching apparatus, plasma etching method and storage mediumYATSUDA KOICHI·Filed 2010·Granted Feb 4, 2014·67 cites·19 claims
- 0695US9997374B2Etching methodTOKYO ELECTRON LTD·Filed 2016·Granted Jun 12, 2018·38 cites·12 claims
- 0795US9922806B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Mar 20, 2018·44 cites·21 claims
- 0893US8790489B2Substrate processing apparatus and substrate processing methodHONDA MASANOBU·Filed 2011·Granted Jul 29, 2014·17 cites·7 claims
- 0991US9659789B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2015·Granted May 23, 2017·11 cites·9 claims
- 1083US8642478B2Plasma processing method and plasma processing apparatusOOYA YOSHINOBU·Filed 2011·Granted Feb 4, 2014·8 cites·10 claims
- 1168US12051570B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 30, 2024·0 cites·19 claims
- 1264US9478387B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Oct 25, 2016·1 cites·6 claims
- 1359US8420547B2Plasma processing methodOOYA YOSHINOBU·Filed 2010·Granted Apr 16, 2013·1 cites·13 claims
- 1453US2018174805A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1549US2009170335A1Plasma etching method, plasma etching apparatus, control program and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1646US9812996B2Method for calculating distance, method for neutralizing electrostatic chuck, and processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Nov 7, 2017·0 cites·3 claims
- 1745US8906808B2Etching methodTOKYO ELECTRON LTD·Filed 2013·Granted Dec 9, 2014·0 cites·8 claims
- 1839US2005106875A1Plasma ashing methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
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