Inventor · disambiguated record
Takayuki Karakawa
Also filed as: KARAKAWA Takayuki
11 granted patents·8 pending applications·33 citations·filing 2012–2022
84Inventor score
Top patents by PatentIndex Score
19 records- 0192US9478410B2Method of forming nitride film with plasmaTOKYO ELECTRON LTD·Filed 2015·Granted Oct 25, 2016·13 cites·8 claims
- 0291US9245741B2Method for forming nitride film using plasma processTOKYO ELECTRON LTD·Filed 2014·Granted Jan 26, 2016·15 cites·5 claims
- 0381US11201053B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 14, 2021·1 cites·3 claims
- 0471US10604845B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Mar 31, 2020·1 cites·8 claims
- 0569US10714332B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·4 claims
- 0667US9922820B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 20, 2018·1 cites·4 claims
- 0767US9892909B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Feb 13, 2018·1 cites·7 claims
- 0861US2023137865A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0953US11837465B2Deposition methodTOKYO ELECTRON LTD·Filed 2021·Granted Dec 5, 2023·0 cites·7 claims
- 1053US11404265B2Film deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 2, 2022·0 cites·17 claims
- 1148US11170999B2Deposition methodTOKYO ELECTRON LTD·Filed 2020·Granted Nov 9, 2021·0 cites·13 claims
- 1247US2015292087A1Substrate Processing Apparatus and Substrate Processing MethodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1344US10626496B2Film forming apparatus, method of cleaning film forming apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Apr 21, 2020·0 cites·10 claims
- 1440US2014357068A1Plasma doping apparatus, plasma doping method, semiconductor device manufacturing method and semiconductor deviceTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 1539US2015031218A1Film forming process and film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1638US2014227458A1Plasma evaluation method, plasma processing method and plasma processing apparatusKARAKAWA Takayuki·Filed 2012·Application pending·0 cites
- 1738US2018245216A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1837US2017218517A1Method of forming nitride filmTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1936US2018135170A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →