Inventor · disambiguated record
Hideyasu Tsuiki
Also filed as: TSUIKI HIDEYASU
7 granted patents·1 pending application·53 citations·filing 1996–2007
83Inventor score
Files withHITACHI CHEMICAL CO LTD7
Top patents by PatentIndex Score
8 records- 0184US5858616APhotosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the sameHITACHI CHEMICAL CO LTD·Filed 1996·Granted Jan 12, 1999·35 cites·4 claims
- 0260US7491789B2Disulfide-containing phenolic resin as curing agent for epoxy resinHITACHI CHEMICAL CO LTD·Filed 2007·Granted Feb 17, 2009·0 cites·1 claims
- 0353US6329111B1Phosphor pattern, processes for preparing the same and photosensitive element to be used for the sameHITACHI CHEMICAL CO LTD·Filed 1997·Granted Dec 11, 2001·8 cites·20 claims
- 0449US6416931B2Photosensitive element for preparing a phosphor patternHITACHI CHEMICAL CO LTD·Filed 2001·Granted Jul 9, 2002·1 cites·7 claims
- 0544US7504471B2Sulfur-containing phenolic resin, process for preparing the same, phenol derivatives having thioether structure or disulfide structure, process for preparing the same and epoxy resin composition and adhesiveHITACHI CHEMICAL CO LTD·Filed 2002·Granted Mar 17, 2009·0 cites·2 claims
- 0644US6077647APhotosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the sameHITACHI CHEMICAL CO LTD·Filed 1998·Granted Jun 20, 2000·6 cites·10 claims
- 0741US6248501B1Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the sameHITACHI CHEMICAL CO LTD·Filed 2000·Granted Jun 19, 2001·3 cites·18 claims
- 0840US2003090193A1Phosphor pattern, processes for preparing the same and photosensitive element to be used for the sameFiled 2002·Application pending·0 cites
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