Inventor · disambiguated record
Masanori Okuyama
Also filed as: OKUYAMA MASANORI
12 granted patents·3 pending applications·211 citations·filing 1997–2006
92Inventor score
Top patents by PatentIndex Score
15 records- 0191US6419849B1Method for manufacturing piezoelectric materialSEIKO EPSON CORP·Filed 2000·Granted Jul 16, 2002·37 cites·16 claims
- 0286US6113733AApparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Sep 5, 2000·76 cites·37 claims
- 0375US6849470B1Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Feb 1, 2005·16 cites·5 claims
- 0475US6727108B2Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Apr 27, 2004·15 cites·11 claims
- 0575US6635495B2Infrared detecting element, infrared two-dimensional image sensor, and method of manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Oct 21, 2003·16 cites·8 claims
- 0670US6402304B1Piezoelectric actuator, ink jet printing head, printer, method for manufacturing piezoelectric actuator, and method for manufacturing ink jet printing headSEIKO EPSON CORP·Filed 1999·Granted Jun 11, 2002·27 cites·23 claims
- 0756US6674081B2Infrared detecting element, infrared two-dimensional image sensor, and method of manufacturing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Jan 6, 2004·5 cites·22 claims
- 0855US6580091B1Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Jun 17, 2003·4 cites·6 claims
- 0953US6576566B2Apparatus and method for forming thin film at low temperature and high deposition rateMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2001·Granted Jun 10, 2003·4 cites·4 claims
- 1052US8303737B2Brass materialKOSAKA YOSHIHARU·Filed 2006·Granted Nov 6, 2012·0 cites·4 claims
- 1145US6803702B2Piezoelectric element and method of manufacturing sameSEIKO EPSON CORP·Filed 2002·Granted Oct 12, 2004·2 cites·6 claims
- 1240US2009092517A1Copper Alloy Extruded Material and Its Manufacturing MethodKOSAKA YOSHIHARU·Filed 2006·Application pending·0 cites
- 1338US6262418B1Thermal type infrared sensing device, fabrication method for thermal type infrared sensing device, and infrared imaging system and infrared imaging apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Jul 17, 2001·9 cites·34 claims
- 1438US2004058066A1Thin film of metal oxide and a method for preparing itFiled 2003·Application pending·0 cites
- 1536US2005279939A1Infrared detection element, infrared detector, solid state imaging device, and method for fabricating infrared detectorMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Application pending·0 cites
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