Inventor · disambiguated record
Masahiko Minemura
Also filed as: MINEMURA MASAHIKO
32 granted patents·9 pending applications·262 citations·filing 1990–2022
96Inventor score
Files withSHINETSU CHEMICAL CO16FUJITSU LTD6MINEMURA MASAHIKO3FUJITSU SEMICONDUCTOR LTD2ISHIDA JUNYA2
Top patents by PatentIndex Score
41 records- 0189US5981641AHeat conductive silicone composition, heat conductive material and heat conductive silicone greaseSHINETSU CHEMICAL CO·Filed 1997·Granted Nov 9, 1999·60 cites·20 claims
- 0284US7303845B2Method and system for efficiently verifying optical proximity correctionFUJITSU LTD·Filed 2005·Granted Dec 4, 2007·9 cites·10 claims
- 0382US7631288B2Optical proximity correction performed with respect to limited areaFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Dec 8, 2009·6 cites·8 claims
- 0481US6507944B1Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording mediumFUJITSU LTD·Filed 2000·Granted Jan 14, 2003·18 cites·8 claims
- 0580US5945185AAir bag made of silicone modified thermoplastic polyurethane resinTAKATA CORP·Filed 1998·Granted Aug 31, 1999·41 cites·8 claims
- 0679US9163121B2Polycarbonate and polysiloxane block copolymer and flame retardant resin compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Oct 20, 2015·2 cites·8 claims
- 0778US12024614B2Rubber compounding ingredient and rubber compositionSHINETSU CHEMICAL CO·Filed 2022·Granted Jul 2, 2024·0 cites·15 claims
- 0874US8394183B2Asymmetric membrane and air-conditioning system using the sameISHIDA JUNYA·Filed 2008·Granted Mar 12, 2013·8 cites·6 claims
- 0973US9508559B2Semiconductor wafer and method for manufacturing semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2013·Granted Nov 29, 2016·4 cites·11 claims
- 1071US8298732B2Exposure method and method of making a semiconductor deviceMINEMURA MASAHIKO·Filed 2011·Granted Oct 30, 2012·2 cites·10 claims
- 1171US6444596B1Air bag and base cloth thereforTAKATA CORP·Filed 2000·Granted Sep 3, 2002·15 cites·5 claims
- 1271US5557000ASilicone oil for low temperature useSHINETSU CHEMICAL CO·Filed 1994·Granted Sep 17, 1996·17 cites·13 claims
- 1369US11708472B2Addition-curing silicone resin for producing heat-shielding film, method for forming heat-shielding film on inner surface of combustion chamber of engine by means of addition-curing silicone resin, heat-shielding film, and heat shielding method for reducing or preventing heat dissipation from combustion chamber of engine to outside by means of heat-shielding filmMAZDA MOTOR·Filed 2021·Granted Jul 25, 2023·0 cites·19 claims
- 1469US2014328779A1Cosmetic product containing film-forming polymerSHINETSU CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1568US7342049B2Dilatant fluid compositionSHINETSU CHEMICAL CO·Filed 2004·Granted Mar 11, 2008·7 cites·6 claims
- 1666US2024301169A1Composition including organosilicon compound, rubber compounding agent, and rubber compositionSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 1765US8080627B2Polycarbonate resin, process for producing the same and electrophotographic photoreceptor using the sameMINEMURA MASAHIKO·Filed 2008·Granted Dec 20, 2011·1 cites·17 claims
- 1865US6444483B1Method and apparatus of producing partial-area mask data filesFUJITSU LTD·Filed 2000·Granted Sep 3, 2002·9 cites·5 claims
- 1964US6942820B2Dimethylpolysiloxane compositionSHINETSU CHEMICAL CO·Filed 2004·Granted Sep 13, 2005·6 cites·4 claims
- 2063US7039889B2Apparatus, method, and program for designing a mask and method for fabricating semiconductor devicesFUJITSU LTD·Filed 2003·Granted May 2, 2006·11 cites·21 claims
- 2161US8288493B2(meth)acrylic-modified siloxane compoundsKUME HIROYUKI·Filed 2009·Granted Oct 16, 2012·1 cites·8 claims
- 2260US12180369B2Rubber composition and organosilicon compoundSHINETSU CHEMICAL CO·Filed 2020·Granted Dec 31, 2024·0 cites·9 claims
- 2360US8394181B2Selectively permeable material, method for producing selectively permeable membrane structure, selectively permeable membrane structure, and air conditioning systemISHIDA JUNYA·Filed 2007·Granted Mar 12, 2013·2 cites·12 claims
- 2459US9163157B2Acrylic resin composition and moldings in which said composition is usedMITSUBISHI GAS CHEMICAL CO·Filed 2013·Granted Oct 20, 2015·0 cites·8 claims
- 2559US5489482AFilm forming compositionSHINETSU CHEMICAL CO·Filed 1994·Granted Feb 6, 1996·17 cites·11 claims
- 2658US6878200B2Mortar or concrete compositionSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 12, 2005·5 cites·14 claims
- 2758US6635392B2Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using sameFUJITSU LTD·Filed 2001·Granted Oct 21, 2003·5 cites·11 claims
- 2857US8173720B2Transparent gel and contact lense from the sameNAKADA KAZUHIKO·Filed 2006·Granted May 8, 2012·3 cites·10 claims
- 2957US2011086227A1Acrylic resin composition and moldings in which said composition is usedMINEMURA MASAHIKO·Filed 2009·Application pending·0 cites
- 3056US12054588B2Organopolysiloxane compound, method for producing same, and antistatic agent and curable composition, each of which contains sameSHINETSU CHEMICAL CO·Filed 2019·Granted Aug 6, 2024·0 cites·12 claims
- 3155US2006160951A1Thermoplastic elastomer and molded product produced from the sameSHINETSU CHEMICAL CO·Filed 2005·Application pending·0 cites
- 3255US2012095135A1Thermoplastic elastomer and molded product produced from the sameMORI HIROYUKI·Filed 2011·Application pending·0 cites
- 3354US5391314AElectroviscous fluid composition comprising a silicone oil, synthetic fluorinated oil and an addition polymerSHINETSU CHEMICAL CO·Filed 1993·Granted Feb 21, 1995·11 cites·11 claims
- 3447US2013272995A1Cosmetic product containing film-forming polymerHAGIWARA MAMORU·Filed 2012·Application pending·0 cites
- 3547US2013164538A1Composite and production method thereofSHINETSU CHEMICAL CO·Filed 2012·Application pending·0 cites
- 3644US8710157B2Contact lens materialSUZUKI YASUHIKO·Filed 2009·Granted Apr 29, 2014·0 cites·26 claims
- 3744US8501878B2Method for producing polycarbonate material having excellent solubility and affinity, and contact lens material comprising the sameSUZUKI YASUHIKO·Filed 2009·Granted Aug 6, 2013·0 cites·29 claims
- 3843US2013095257A1Surfactant composition, coating solution containing the surfactant composition, and rubber article treated by the coating solutionNISSIN CHEMICAL IND·Filed 2012·Application pending·0 cites
- 3940US8365105B2Method of performing optical proximity effect corrections to photomask patternFUJITSU SEMICONDUCTOR LTD·Filed 2010·Granted Jan 29, 2013·0 cites·10 claims
- 4033US5192458ASilicone grease composition including an organomolybdenum compoundSHINETSU CHEMICAL CO·Filed 1990·Granted Mar 9, 1993·2 cites·4 claims
- 4133US2006214119A1Pattern data creation method, pattern data creation program, computer-readable medium and fabrication process of a semiconductor deviceFUJITSU LTD·Filed 2005·Application pending·0 cites
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