Inventor · disambiguated record
Cheng-Bai Xu
Also filed as: XU CHENG · XU CHENG-BAI
71 granted patents·18 pending applications·149 citations·filing 2003–2025
98Inventor score
Top patents by PatentIndex Score
89 records- 0193US9156785B2Base reactive photoacid generators and photoresists comprising sameAQAD EMAD·Filed 2011·Granted Oct 13, 2015·9 cites·10 claims
- 0291US9046767B2Photoacid generator, photoresist, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2013·Granted Jun 2, 2015·7 cites·19 claims
- 0391US9029065B2Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an articleROHM & HAAS ELECT MAT·Filed 2012·Granted May 12, 2015·7 cites·20 claims
- 0491US8900794B2Photoacid generator and photoresist comprising sameROHM & HAAS ELECT MAT·Filed 2012·Granted Dec 2, 2014·7 cites·22 claims
- 0591US8257902B2Compositons and processes for immersion lithographyWANG DEYAN·Filed 2008·Granted Sep 4, 2012·10 cites·10 claims
- 0690US9488910B2Sulfonyl photoacid generators and photoresists comprising sameLIU CONG·Filed 2010·Granted Nov 8, 2016·6 cites·10 claims
- 0789US8871428B2Compositions and processes for immersion lithographyWANG DEYAN·Filed 2012·Granted Oct 28, 2014·4 cites·6 claims
- 0888US9209035B2Photoresist pattern trimming methodsROHM & HAAS ELECT MAT·Filed 2012·Granted Dec 8, 2015·7 cites·18 claims
- 0987US9348220B2Photoacid generators and photoresists comprising sameAQAD EMAD·Filed 2011·Granted May 24, 2016·5 cites·13 claims
- 1086US10221131B2Acid generator compounds and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2016·Granted Mar 5, 2019·4 cites·18 claims
- 1186US9012128B2Photoresist and coated substrate comprising sameRohm and Hass Electronic Materials LLC·Filed 2013·Granted Apr 21, 2015·5 cites·7 claims
- 1285US8722825B2Surface active additive and photoresist composition comprising sameWANG DEYAN·Filed 2012·Granted May 13, 2014·4 cites·6 claims
- 1384US10466588B2Sulfonyl photoacid generators and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2016·Granted Nov 5, 2019·2 cites·13 claims
- 1483US9671689B2Cholate photoacid generators and photoresists comprising sameAQAD EMAD·Filed 2010·Granted Jun 6, 2017·3 cites·6 claims
- 1581US11506981B2Photoresist pattern trimming compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2020·Granted Nov 22, 2022·1 cites·16 claims
- 1681US9869933B2Pattern trimming methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Jan 16, 2018·3 cites·12 claims
- 1781US9541834B2Ionic thermal acid generators for low temperature applicationsROHM & HAAS ELECT MAT·Filed 2012·Granted Jan 10, 2017·3 cites·16 claims
- 1881US9507259B2Photoresist compositionLI MINGQI·Filed 2012·Granted Nov 29, 2016·4 cites·14 claims
- 1981US9508549B2Methods of forming electronic devices including filling porous features with a polymerROHM & HAAS ELECT MAT·Filed 2015·Granted Nov 29, 2016·3 cites·12 claims
- 2081US9209067B2Gap-fill methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Dec 8, 2015·5 cites·10 claims
- 2180US9067909B2Photoacid generator, photoresist, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2013·Granted Jun 30, 2015·3 cites·19 claims
- 2278US9583344B2Photoresist pattern trimming methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 28, 2017·2 cites·19 claims
- 2378US9209028B2Ion implantation methodsROHM & HAAS ELECT MAT·Filed 2013·Granted Dec 8, 2015·4 cites·13 claims
- 2476US10539870B2Photoresists comprising carbamate componentROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 21, 2020·2 cites·24 claims
- 2575US10162266B2Photoresist pattern trimming methodsROHM & HAAS ELECT MAT·Filed 2013·Granted Dec 25, 2018·2 cites·16 claims
- 2675US9324604B2Gap-fill methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Apr 26, 2016·3 cites·10 claims
- 2775US9256125B2Acid generators and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2013·Granted Feb 9, 2016·1 cites·21 claims
- 2875US9110369B2Photoacid generator, photoresist, coated substrate, and method of forming an electronic deviceROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 18, 2015·2 cites·12 claims
- 2975US8927190B2Photoresist comprising nitrogen-containing compoundLIU CONG·Filed 2011·Granted Jan 6, 2015·1 cites·18 claims
- 3075US8603728B2Polymer composition and photoresist comprising the polymerPROKOPOWICZ GREGORY P·Filed 2012·Granted Dec 10, 2013·3 cites·7 claims
- 3175US8338077B2Photoacid generators and photoresists comprising sameLI MINGQI·Filed 2010·Granted Dec 25, 2012·2 cites·2 claims
- 3274US10578969B2Photoresist topcoat compositions and methods of processing photoresist compositionsROHM & HAAS ELECT MAT·Filed 2019·Granted Mar 3, 2020·1 cites·13 claims
- 3374US8956799B2Photoacid generator and photoresist comprising sameROHM & HAAS ELECT MAT·Filed 2012·Granted Feb 17, 2015·2 cites·13 claims
- 3474US7592125B2Photoresist compositions comprising resin blendsROHM AND HAAS ELECTRIC MATERIA·Filed 2006·Granted Sep 22, 2009·13 cites·15 claims
- 3573US9753370B2Multiple-pattern forming methodsROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 5, 2017·2 cites·13 claims
- 3668US9760011B1Pattern trimming compositions and methodsROHM & HAAS ELECT MAT·Filed 2016·Granted Sep 12, 2017·1 cites·11 claims
- 3766US9448486B2Photoresist pattern trimming compositions and methodsROHM & HAAS ELECT MAT·Filed 2014·Granted Sep 20, 2016·1 cites·18 claims
- 3865US9581904B2Photoresist overcoat compositionsROHM & HAAS ELECT MAT·Filed 2015·Granted Feb 28, 2017·1 cites·19 claims
- 3965US9436082B2Compositions comprising base-reactive component and processes for photolithographyWANG DEYAN·Filed 2011·Granted Sep 6, 2016·1 cites·9 claims
- 4065US9146470B2Photoacid generator and photoresist comprising sameROHM & HAAS ELECT MAT·Filed 2014·Granted Sep 29, 2015·0 cites·7 claims
- 4165US9005880B2Compositions comprising sulfonamide material and processes for photolithographyWANG DEYAN·Filed 2009·Granted Apr 14, 2015·1 cites·12 claims
- 4265US8975006B2Compositions comprising carboxy component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Mar 10, 2015·1 cites·6 claims
- 4364US2023152697A1Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 4461US2019346763A1Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2019·Application pending·0 cites
- 4560US10809616B2Cholate photoacid generators and photoresists comprising sameROHM & HAAS ELECT MAT·Filed 2017·Granted Oct 20, 2020·0 cites·9 claims
- 4660US10222699B2Compositions and processes for immersion lithographyROHM & HAAS ELECT MAT·Filed 2014·Granted Mar 5, 2019·0 cites·2 claims
- 4759US12228859B2Pattern formation methodsROHM & HAAS ELECT MAT·Filed 2018·Granted Feb 18, 2025·0 cites·11 claims
- 4859US10359698B2Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithographyWANG DEYAN·Filed 2009·Granted Jul 23, 2019·0 cites·8 claims
- 4956US9255079B2Photoacid generators and photoresists comprising sameLI MINGQI·Filed 2010·Granted Feb 9, 2016·0 cites·5 claims
- 5055US10719014B2Photoresists comprising amide componentROHM & HAAS ELECT MAT·Filed 2013·Granted Jul 21, 2020·0 cites·18 claims
Showing the top 50 of 89 patent records by PatentIndex Score.
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