Inventor · disambiguated record
Chang Il Oh
Also filed as: OH CHANG I · OH CHANG-IL
24 granted patents·4 pending applications·260 citations·filing 1999–2014
96Inventor score
Files withCHEIL IND INC11DONGJIN SEMICHEM CO LTD7UH DONG SEON2YOON KYONG HO2DONG JIN SEMICHEM CO LTD1
Top patents by PatentIndex Score
28 records- 0195US8445187B2Hardmask composition having antireflective properties and method of patterning material on substrate using the sameYOON KYONG HO·Filed 2011·Granted May 21, 2013·16 cites·13 claims
- 0295US7378217B2Antireflective hardmask composition and methods for using sameCHEIL IND INC·Filed 2006·Granted May 27, 2008·25 cites·14 claims
- 0394US7981594B2Hardmask composition having antirelective properties and method of patterning material on susbstrate using the sameCHEIL IND INC·Filed 2008·Granted Jul 19, 2011·19 cites·12 claims
- 0491US7862990B2Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layerCHEIL IND INC·Filed 2007·Granted Jan 4, 2011·12 cites·15 claims
- 0589US7514199B2Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the sameCHEIL IND INC·Filed 2006·Granted Apr 7, 2009·12 cites·49 claims
- 0686US8420289B2Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methodsKIM MIN SOO·Filed 2009·Granted Apr 16, 2013·10 cites·17 claims
- 0786US8263321B2Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layerYOON KYONG HO·Filed 2010·Granted Sep 11, 2012·4 cites·10 claims
- 0884US8999862B1Methods of fabricating nano-scale structures and nano-scale structures fabricated therebySK HYNIX INC·Filed 2014·Granted Apr 7, 2015·7 cites·20 claims
- 0984US7655386B2Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated deviceCHEIL IND INC·Filed 2007·Granted Feb 2, 2010·9 cites·19 claims
- 1083US6579668B1Photoresist remover compositionDONGJIN SEMICHEM CO LTD·Filed 2000·Granted Jun 17, 2003·24 cites·9 claims
- 1182US7659051B2Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layerCHEIL IND INC·Filed 2007·Granted Feb 9, 2010·4 cites·24 claims
- 1278US7405029B2Antireflective hardmask composition and methods for using sameCHEIL IND INC·Filed 2006·Granted Jul 29, 2008·5 cites·12 claims
- 1375US7829638B2Antireflective hardmask composition and methods for using sameCHEIL IND INC·Filed 2006·Granted Nov 9, 2010·4 cites·12 claims
- 1474US7629260B2Organosilane hardmask compositions and methods of producing semiconductor devices using the sameCHEIL IND INC·Filed 2006·Granted Dec 8, 2009·4 cites·11 claims
- 1571US6140027APhotoresist remover compositionDONGJIN SEMICHEM CO LTD·Filed 1999·Granted Oct 31, 2000·42 cites·10 claims
- 1665US6183942B1Thinner composition for removing spin-on-glass and photoresistDONGJIN SEMICHEM CO LTD·Filed 1999·Granted Feb 6, 2001·25 cites·5 claims
- 1764US7015183B2Resist remover compositionDONGJIN SEMICHEM CO LTD·Filed 2001·Granted Mar 21, 2006·8 cites·6 claims
- 1861US7632622B2Antireflective hardmask composition and methods for using sameCHEIL IND INC·Filed 2005·Granted Dec 15, 2009·8 cites·15 claims
- 1961US6774097B2Resist stripper compositionDONGJIN SEMICHEM CO LTD·Filed 2001·Granted Aug 10, 2004·7 cites·4 claims
- 2057US6908892B2Photoresist remover compositionDONGJIN SEMICHEM CO LTD·Filed 2001·Granted Jun 21, 2005·5 cites·4 claims
- 2156US6683034B1Stripper composition for negative chemically amplified resistDONGJIN SEMICHEM CO LTD·Filed 2000·Granted Jan 27, 2004·2 cites·5 claims
- 2250US6861210B2Resist remover compositionDONGJIN SEMICHEN CO LTD·Filed 2001·Granted Mar 1, 2005·4 cites·5 claims
- 2347US7879526B2Hardmask compositions for resist underlayer filmsCHEIL IND INC·Filed 2006·Granted Feb 1, 2011·0 cites·26 claims
- 2447US7112795B2Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometerDONG JIN SEMICHEM CO LTD·Filed 2001·Granted Sep 26, 2006·4 cites·7 claims
- 2543US2007212886A1Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositionsUH DONG SEON·Filed 2006·Application pending·0 cites
- 2640US2006269867A1Antireflective hardmask composition and methods for using sameUH DONG S·Filed 2006·Application pending·0 cites
- 2739US2010320573A1Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositionsUH DONG SEON·Filed 2010·Application pending·0 cites
- 2833US2004185370A1Resist remover compositionFiled 2001·Application pending·0 cites
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