Inventor · disambiguated record
Paul Andre Lefevre
Also filed as: LEFEVRE PAUL · LEFEVRE PAUL ANDRE
26 granted patents·7 pending applications·135 citations·filing 2008–2024
95Inventor score
Top patents by PatentIndex Score
33 records- 0197US9067297B2Polishing pad with foundation layer and polishing surface layerALLISON WILLIAM C·Filed 2011·Granted Jun 30, 2015·31 cites·82 claims
- 0295US9067298B2Polishing pad with grooved foundation layer and polishing surface layerLEFEVRE PAUL ANDRE·Filed 2011·Granted Jun 30, 2015·21 cites·28 claims
- 0391US9649742B2Polishing pad having polishing surface with continuous protrusionsNEXPLANAR CORP·Filed 2013·Granted May 16, 2017·13 cites·22 claims
- 0491US9162341B2Chemical-mechanical planarization pad including patterned structural domainsINNOPAD INC·Filed 2013·Granted Oct 20, 2015·15 cites·5 claims
- 0588US9868185B2Polishing pad with foundation layer and window attached theretoCABOT MICROELECTRONICS CORP·Filed 2015·Granted Jan 16, 2018·3 cites·28 claims
- 0686US8172648B2Chemical-mechanical planarization padLEFEVRE PAUL·Filed 2008·Granted May 8, 2012·13 cites·16 claims
- 0785US9238294B2Polishing pad having porogens with liquid fillerLEFEVRE PAUL ANDRE·Filed 2014·Granted Jan 19, 2016·5 cites·65 claims
- 0884US8684794B2Chemical mechanical planarization pad with void networkLEFEVRE PAUL·Filed 2008·Granted Apr 1, 2014·15 cites·25 claims
- 0982US10160092B2Polishing pad having polishing surface with continuous protrusions having tapered sidewallsNEXPLANAR CORP·Filed 2013·Granted Dec 25, 2018·5 cites·37 claims
- 1080US2024238937A1Chemical mechanical planarization pads with constant groove volumeCMC MAT LLC·Filed 2024·Application pending·0 cites
- 1176US2023166380A1Endpoint window with controlled texture surfaceCMC MAT INC·Filed 2023·Application pending·0 cites
- 1271US11938584B2Chemical mechanical planarization pads with constant groove volumeCABOT MICROELECTRONICS CORP·Filed 2020·Granted Mar 26, 2024·0 cites·10 claims
- 1371US2022234167A1Endpoint window with controlled texture surfaceCMC MAT INC·Filed 2022·Application pending·0 cites
- 1469US9597769B2Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layerLEFEVRE PAUL ANDRE·Filed 2012·Granted Mar 21, 2017·2 cites·59 claims
- 1567US8758659B2Method of grooving a chemical-mechanical planarization padLEFEVRE PAUL·Filed 2010·Granted Jun 24, 2014·2 cites·19 claims
- 1667US8430721B2Chemical-mechanical planarization padHSU OSCAR K·Filed 2008·Granted Apr 30, 2013·3 cites·16 claims
- 1765US12459076B2Chemical-mechanical polishing subpad having porogens with polymeric shellsCMC MAT INC·Filed 2021·Granted Nov 4, 2025·0 cites·8 claims
- 1862US8435099B2Chemical-mechanical planarization pad including patterned structural domainsLEFEVRE PAUL·Filed 2010·Granted May 7, 2013·1 cites·14 claims
- 1961US9931728B2Polishing pad with foundation layer and polishing surface layerNEXPLANAR CORP·Filed 2015·Granted Apr 3, 2018·0 cites·23 claims
- 2061US8546260B2Fabric containing non-crimped fibers and methods of manufactureHSU OSCAR K·Filed 2009·Granted Oct 1, 2013·1 cites·22 claims
- 2161US8491360B2Three-dimensional network in CMP padLEFEVRE PAUL·Filed 2008·Granted Jul 23, 2013·2 cites·28 claims
- 2261US7985121B2Chemical-mechanical planarization pad having end point detection windowINNOPAD INC·Filed 2008·Granted Jul 26, 2011·2 cites·17 claims
- 2360US9931729B2Polishing pad with grooved foundation layer and polishing surface layerNEXPLANAR CORP·Filed 2015·Granted Apr 3, 2018·0 cites·23 claims
- 2460US9796063B2Multi-layered chemical-mechanical planarization padFNS TECH CO LTD·Filed 2014·Granted Oct 24, 2017·0 cites·13 claims
- 2559US2015273656A1Polishing pad with foundation layer and polishing surface layerALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 2657US2016144477A1Coated compressive subpad for chemical mechanical polishingSCOTT DIANE·Filed 2015·Application pending·0 cites
- 2756US11440158B2Coated compressive subpad for chemical mechanical polishingCABOT MICROELECTRONICS CORP·Filed 2018·Granted Sep 13, 2022·0 cites·10 claims
- 2856US8377351B2Polishing pad with controlled void formationINNOPAD INC·Filed 2008·Granted Feb 19, 2013·1 cites·16 claims
- 2955US2022203497A1Chemical-mechanical polishing pad with textured platen adhesiveCMC MAT INC·Filed 2020·Application pending·0 cites
- 3054US10946495B2Low density polishing padNEXPLANAR CORP·Filed 2015·Granted Mar 16, 2021·0 cites·11 claims
- 3152US10293459B2Polishing pad having polishing surface with continuous protrusionsNEXPLANAR CORP·Filed 2017·Granted May 21, 2019·0 cites·23 claims
- 3251US8790165B2Multi-layered chemical-mechanical planarization padLEFEVRE PAUL·Filed 2010·Granted Jul 29, 2014·0 cites·8 claims
- 3347US2015038066A1Low density polishing padNEXPLANAR CORP·Filed 2013·Application pending·0 cites
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