Inventor · disambiguated record
Hidehisa Murase
Also filed as: MURASE HIDEHISA
10 granted patents·3 pending applications·100 citations·filing 2002–2012
88Inventor score
Top patents by PatentIndex Score
13 records- 0189US7863542B2Laser processing apparatus and laser processing method as well as debris extraction mechanism and debris extraction methodSONY CORP·Filed 2006·Granted Jan 4, 2011·14 cites·11 claims
- 0288US8344285B2Process and apparatus for ablationEXITECH LTD·Filed 2005·Granted Jan 1, 2013·18 cites·15 claims
- 0386US7692115B2Laser processing device, laser processing head and laser processing methodSONY CORP·Filed 2007·Granted Apr 6, 2010·10 cites·12 claims
- 0485US8809732B2Process and apparatus for ablationTEL SOLAR AG·Filed 2012·Granted Aug 19, 2014·8 cites·9 claims
- 0585US7135250B2Multi-layer electrode structure and battery incorporating sameSONY CORP·Filed 2002·Granted Nov 14, 2006·28 cites·6 claims
- 0684US8288681B2Laser processing apparatus and laser processing method as well as debris extraction mechanism and debris extraction methodMURASE HIDEHISA·Filed 2006·Granted Oct 16, 2012·10 cites·17 claims
- 0782US8283596B2Laser processing apparatus and laser processing method, debris collection mechanism and debris collection method, and method for producing display panelMURASE HIDEHISA·Filed 2008·Granted Oct 9, 2012·8 cites·14 claims
- 0868US8581140B2Laser processing apparatus, laser processing head and laser processing methodASO KOSEI·Filed 2006·Granted Nov 12, 2013·4 cites·5 claims
- 0955US7419512B2Electrode, battery using the same and method for manufacturing the electrodeSONY CORP·Filed 2006·Granted Sep 2, 2008·0 cites·5 claims
- 1054US2010062222A1Die manufacturing method, functional film manufacturing method and functional filmSONY CORP·Filed 2009·Application pending·0 cites
- 1146US8546197B2Thin film transistor, method of manufacturing the same, and electronic deviceKAWASHIMA NORIYUKI·Filed 2011·Granted Oct 1, 2013·0 cites·6 claims
- 1240US2011227255A1Manufacturing method for a shaped article having a very fine uneven surface structureSONY CORP·Filed 2011·Application pending·0 cites
- 1338US2010225027A1Optical processing method and maskSONY CORP·Filed 2010·Application pending·0 cites
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