Inventor · disambiguated record
Noriaki Shimodaira
Also filed as: SHIMODAIRA NORIAKI
11 granted patents·4 pending applications·212 citations·filing 1998–2011
91Inventor score
Top patents by PatentIndex Score
15 records- 0196US7838136B2Glass for information recording media substrate, glass substrate for magnetic disk and magnetic diskASAHI GLASS CO LTD·Filed 2008·Granted Nov 23, 2010·44 cites·8 claims
- 0291US6544914B1Synthetic quartz glass for optical member, process for producing the same, and method of using the sameASAHI GLASS CO LTD·Filed 2000·Granted Apr 8, 2003·29 cites·11 claims
- 0386US6576578B1Synthetic quartz glass and method for preparing the sameASAHI GLASS CO LTD·Filed 2000·Granted Jun 10, 2003·32 cites·12 claims
- 0486US6499317B1Synthetic quartz glass and method for production thereofASAHI GLASS CO LTD·Filed 1999·Granted Dec 31, 2002·32 cites·20 claims
- 0575US7959493B2Method for polishing glass substrate and process for producing glass substrateASAHI GLASS CO LTD·Filed 2009·Granted Jun 14, 2011·3 cites·9 claims
- 0675US6891147B2Wavelength-selective diffraction element and an optical head deviceASAHI GLASS CO LTD·Filed 2003·Granted May 10, 2005·19 cites·10 claims
- 0771US6611317B1Exposure apparatus, semiconductor device, and photomaskASAHI GLASS CO LTD·Filed 2000·Granted Aug 26, 2003·11 cites·4 claims
- 0869US6038123AElectric double layer capacitor, and carbon material and electrode thereforASAHI GLASS CO LTD·Filed 1998·Granted Mar 14, 2000·35 cites·19 claims
- 0965US8119268B2Glass for information recording media substrate, glass substrate for magnetic disk and magnetic diskNAKASHIMA TETSUYA·Filed 2010·Granted Feb 21, 2012·1 cites·16 claims
- 1065US7022633B2Synthetic quartz glass and process for producing itASAHI GLASS CO LTD·Filed 2002·Granted Apr 4, 2006·6 cites·10 claims
- 1165US2009242387A1Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2ASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1256US2007207911A1Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2ASAHI GLASS CO LTD·Filed 2007·Application pending·0 cites
- 1349US2010159808A1Method of glass surface fine processingASAHI GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1438US8402786B2Synthetic silica glass optical component and process for its productionIKUTA YOSHIAKI·Filed 2002·Granted Mar 26, 2013·0 cites·7 claims
- 1535US2011189505A1Method for manufacturing glass substrate for magnetic recording mediumASAHI GLASS CO LTD·Filed 2011·Application pending·0 cites
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