Inventor · disambiguated record
Andrew R. Romano
Also filed as: ROMANO ANDREW R
9 granted patents·5 pending applications·549 citations·filing 1998–2012
88Inventor score
Top patents by PatentIndex Score
14 records- 0196US8282847B2Photoresist double patterningROMANO ANDREW R·Filed 2008·Granted Oct 9, 2012·483 cites·10 claims
- 0293US7473512B2Process of imaging a deep ultraviolet photoresist with a top coating and materials thereofAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Jan 6, 2009·18 cites·27 claims
- 0381US7816071B2Process of imaging a photoresist with multiple antireflective coatingsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 19, 2010·19 cites·22 claims
- 0474US7977242B2Double mask self-aligned double patterning technology (SADPT) processLAM RES CORP·Filed 2009·Granted Jul 12, 2011·4 cites·18 claims
- 0566US8361564B2Protective layer for implant photoresistLAM RES CORP·Filed 2008·Granted Jan 29, 2013·2 cites·15 claims
- 0661US5989763AChemical gas analysis during processing of chemically amplified photoresist systemsNAT SEMICONDUCTOR CORP·Filed 1998·Granted Nov 23, 1999·20 cites·18 claims
- 0753US7537879B2Photoresist composition for deep UV and process thereofAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted May 26, 2009·3 cites·20 claims
- 0847US8911587B2Photoresist double patterning apparatusROMANO ANDREW R·Filed 2012·Granted Dec 16, 2014·0 cites·10 claims
- 0946US2012282780A9Etch with high etch rate resist maskROMANO ANDREW R·Filed 2008·Application pending·0 cites
- 1043US2006131240A1Process for treating solventsROMANO ANDREW R·Filed 2004·Application pending·0 cites
- 1142US2005202347A1Process of imaging a deep ultraviolet photoresist with a top coating and materials thereofFiled 2004·Application pending·0 cites
- 1241US2005202351A1Process of imaging a deep ultraviolet photoresist with a top coating and materials thereofFiled 2004·Application pending·0 cites
- 1340US8956147B2Mold for rectangular structureDILLON CRAIG T·Filed 2011·Granted Feb 17, 2015·0 cites·15 claims
- 1440US2006177772A1Process of imaging a photoresist with multiple antireflective coatingsABDALLAH DAVID J·Filed 2005·Application pending·0 cites
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