Inventor · disambiguated record
Tony F. Heinz
Also filed as: HEINZ TONY F · HEINZ TONY FREDERICK
21 granted patents·1,213 citations·filing 1992–1997
97Inventor score
Files withIBM21
Top patents by PatentIndex Score
21 records- 0197US5559428AIn-situ monitoring of the change in thickness of filmsIBM·Filed 1995·Granted Sep 24, 1996·258 cites·19 claims
- 0295US6072313AIn-situ monitoring and control of conductive films by detecting changes in induced eddy currentsIBM·Filed 1997·Granted Jun 6, 2000·163 cites·12 claims
- 0395US5660672AIn-situ monitoring of conductive films on semiconductor wafersIBM·Filed 1995·Granted Aug 26, 1997·155 cites·64 claims
- 0492US5731697AIn-situ monitoring of the change in thickness of filmsIBM·Filed 1996·Granted Mar 24, 1998·108 cites·13 claims
- 0583US5294289ADetection of interfaces with atomic resolution during material processing by optical second harmonic generationIBM·Filed 1993·Granted Mar 15, 1994·113 cites·20 claims
- 0682US5392124AMethod and apparatus for real-time, in-situ endpoint detection and closed loop etch process controlIBM·Filed 1993·Granted Feb 21, 1995·52 cites·40 claims
- 0776US5788801AReal time measurement of etch rate during a chemical etching processIBM·Filed 1997·Granted Aug 4, 1998·49 cites·6 claims
- 0872US5381234AMethod and apparatus for real-time film surface detection for large area wafersIBM·Filed 1993·Granted Jan 10, 1995·36 cites·23 claims
- 0966US5516399AContactless real-time in-situ monitoring of a chemical etchingIBM·Filed 1994·Granted May 14, 1996·40 cites·18 claims
- 1065US5501766AMinimizing overetch during a chemical etching processIBM·Filed 1994·Granted Mar 26, 1996·26 cites·15 claims
- 1165US5386121AIn situ, non-destructive CVD surface monitorIBM·Filed 1993·Granted Jan 31, 1995·24 cites·14 claims
- 1264US5456788AMethod and apparatus for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1995·Granted Oct 10, 1995·25 cites·10 claims
- 1362US5338390AContactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1992·Granted Aug 16, 1994·32 cites·14 claims
- 1456US5573624AChemical etch monitor for measuring film etching uniformity during a chemical etching processIBM·Filed 1994·Granted Nov 12, 1996·26 cites·10 claims
- 1556US5445705AMethod and apparatus for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1994·Granted Aug 29, 1995·22 cites·10 claims
- 1653US5582746AReal time measurement of etch rate during a chemical etching processIBM·Filed 1994·Granted Dec 10, 1996·19 cites·11 claims
- 1753US5500073AReal time measurement of etch rate during a chemical etching processIBM·Filed 1995·Granted Mar 19, 1996·15 cites·15 claims
- 1846US5489361AMeasuring film etching uniformity during a chemical etching processIBM·Filed 1994·Granted Feb 6, 1996·15 cites·5 claims
- 1946US5480511AMethod for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1994·Granted Jan 2, 1996·13 cites·18 claims
- 2045US5451289AFixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraintIBM·Filed 1994·Granted Sep 19, 1995·15 cites·1 claims
- 2141US5573623AApparatus for contactless real-time in-situ monitoring of a chemical etching processIBM·Filed 1995·Granted Nov 12, 1996·7 cites·38 claims
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