Inventor · disambiguated record
Jun-Cheng Lai
Also filed as: LAI JUN · LAI JUN-CHENG
5 granted patents·4 pending applications·25 citations·filing 1998–2024
73Inventor score
Files withPOWERCHIP SEMICONDUCTOR CORP2POWERCHIP SEMICONDUCTOR MFG CORP2WORLDWIDE SEMICONDUCTOR MFG2HUAWEI TECH CO LTD1POWERCHIP TECH CORP1
Top patents by PatentIndex Score
9 records- 0157US6187486B1Method of multi-exposure for improving photolithography resolutionWORLDWIDE SEMICONDUCTOR MFG·Filed 1999·Granted Feb 13, 2001·18 cites·6 claims
- 0256US2025246550A1Semiconductor device and method for forming the samePOWERCHIP SEMICONDUCTOR MFG CORP·Filed 2024·Application pending·0 cites
- 0353US2024337920A1Design method of photomask structurePOWERCHIP SEMICONDUCTOR MFG CORP·Filed 2023·Application pending·0 cites
- 0448US2025347730A1Apparatus and method for pattern recognition of partial discharge defect typeZHEJIANG TAILUN POWER GROUP CO LTD·Filed 2024·Application pending·0 cites
- 0545US7008733B2Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principlePOWERCHIP SEMICONDUCTOR CORP·Filed 2003·Granted Mar 7, 2006·2 cites·16 claims
- 0640US2019205160A1Application Process Management Method And Terminal DeviceHUAWEI TECH CO LTD·Filed 2019·Application pending·0 cites
- 0734US9508138B2Method of detecting photolithographic hotspotsPOWERCHIP TECH CORP·Filed 2015·Granted Nov 29, 2016·0 cites·9 claims
- 0834US7461472B2Half-tone phase shift mask and patterning method using thereofPOWERCHIP SEMICONDUCTOR CORP·Filed 2003·Granted Dec 9, 2008·0 cites·9 claims
- 0933US6200708B1Method for automatically determining adjustments for stepping photolithography exposuresWORLDWIDE SEMICONDUCTOR MFG·Filed 1998·Granted Mar 13, 2001·5 cites·7 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →