Inventor · disambiguated record
Alexander Hendrik Vincent Van Veen
Also filed as: VAN VEEN ALEXANDER · VAN VEEN ALEXANDER HENDRIK · VAN VEEN ALEXANDER HENDRIK VIN · VAN VEEN ALEXANDER HENDRIK VINCENT
31 granted patents·3 pending applications·361 citations·filing 2003–2023
96Inventor score
Files withWIELAND MARCO JAN-JACO15ASML NETHERLANDS BV8MAPPER LITHOGRAPHY IP BV8VAN VEEN ALEXANDER HENDRIK VINCENT2ELDICO SCIENT AG1
Top patents by PatentIndex Score
34 records- 0198US7091504B2Electron beam exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2005·Granted Aug 15, 2006·50 cites·36 claims
- 0298US6897458B2Electron beam exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2003·Granted May 24, 2005·144 cites·36 claims
- 0396US8089056B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2009·Granted Jan 3, 2012·29 cites·20 claims
- 0494US8618496B2Charged particle system comprising a manipulator device for manipulation of one or more charged particle beamsWIELAND MARCO JAN-JACO·Filed 2012·Granted Dec 31, 2013·38 cites·36 claims
- 0593US8258484B2Beamlet blanker arrangementWIELAND MARCO JAN JACO·Filed 2010·Granted Sep 4, 2012·16 cites·19 claims
- 0692US8653485B2Projection lens arrangementWIELAND MARCO JAN-JACO·Filed 2012·Granted Feb 18, 2014·13 cites·21 claims
- 0791US8492731B2Charged particle multi-beamlet lithography system with modulation deviceWIELAND MARCO JAN-JACO·Filed 2010·Granted Jul 23, 2013·9 cites·24 claims
- 0891US8445869B2Projection lens arrangementWIELAND MARCO JAN-JACO·Filed 2010·Granted May 21, 2013·12 cites·14 claims
- 0990US8558196B2Charged particle lithography system with aperture array coolingWIELAND MARCO JAN-JACO·Filed 2011·Granted Oct 15, 2013·11 cites·32 claims
- 1087US11728123B2Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatusVAN VEEN ALEXANDER HENDRIK VINCENT·Filed 2021·Granted Aug 15, 2023·2 cites·20 claims
- 1186US11101099B2Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatusASML NETHERLANDS BV·Filed 2018·Granted Aug 24, 2021·4 cites·20 claims
- 1286US10037864B2High voltage shielding and cooling in a charged particle beam generatorMAPPER LITHOGRAPHY IP BV·Filed 2017·Granted Jul 31, 2018·3 cites·37 claims
- 1385US8502176B2Imaging systemWIELAND MARCO JAN-JACO·Filed 2009·Granted Aug 6, 2013·8 cites·9 claims
- 1484US8890094B2Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Nov 18, 2014·6 cites·19 claims
- 1584US8604411B2Charged particle beam modulatorWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 10, 2013·6 cites·31 claims
- 1680US11961627B2Vacuum chamber arrangement for charged particle beam generatorASML NETHERLANDS BV·Filed 2023·Granted Apr 16, 2024·0 cites·20 claims
- 1780US8921758B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 30, 2014·4 cites·30 claims
- 1878US12327707B2Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatusASML NETHERLANDS BV·Filed 2023·Granted Jun 10, 2025·0 cites·20 claims
- 1975US12387903B2Aberration correction in charged particle systemASML NETHERLANDS BV·Filed 2022·Granted Aug 12, 2025·0 cites·20 claims
- 2075US11348756B2Aberration correction in charged particle systemASML NETHERLANDS BV·Filed 2018·Granted May 31, 2022·1 cites·27 claims
- 2175US8841636B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2010·Granted Sep 23, 2014·2 cites·23 claims
- 2273US11705252B2Vacuum chamber arrangement for charged particle beam generatorASML NETHERLANDS BV·Filed 2021·Granted Jul 18, 2023·0 cites·20 claims
- 2373US9653261B2Charged particle lithography system and beam generatorMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted May 16, 2017·2 cites·27 claims
- 2472US11094426B2Vacuum chamber arrangement for charged particle beam generatorASML NETHERLANDS BV·Filed 2020·Granted Aug 17, 2021·0 cites·20 claims
- 2571USRE44908EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2012·Granted May 27, 2014·1 cites·56 claims
- 2662USRE44240EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2008·Granted May 28, 2013·0 cites·131 claims
- 2761US10586625B2Vacuum chamber arrangement for charged particle beam generatorASML NETHERLANDS BV·Filed 2017·Granted Mar 10, 2020·0 cites·19 claims
- 2859US8759787B2Charged particle multi-beamlet lithography system with modulation deviceMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Jun 24, 2014·0 cites·12 claims
- 2957USRE45049EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2012·Granted Jul 29, 2014·0 cites·102 claims
- 3053US9105439B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2011·Granted Aug 11, 2015·0 cites·23 claims
- 3153US2009261267A1Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2009·Application pending·0 cites
- 3242US2024355577A1Charged-particle beam device for diffraction analysisELDICO SCIENT AG·Filed 2022·Application pending·0 cites
- 3338US9208989B2Lithography system and method of refractingVAN VEEN ALEXANDER HENDRIK VINCENT·Filed 2011·Granted Dec 8, 2015·0 cites·22 claims
- 3434US2011042579A1Charged particle lithography apparatus and method of generating vacuum in a vacuum chamberMAPPER LITHOGRAPHY IP BV·Filed 2010·Application pending·0 cites
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