Inventor · disambiguated record
Bert Jan Kampherbeek
Also filed as: KAMPHERBEEK BERT JAN
9 granted patents·2 pending applications·240 citations·filing 2002–2013
88Inventor score
Top patents by PatentIndex Score
11 records- 0198US7091504B2Electron beam exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2005·Granted Aug 15, 2006·50 cites·36 claims
- 0298US6897458B2Electron beam exposure systemMAPPER LITHOGRAPHY IP BV·Filed 2003·Granted May 24, 2005·144 cites·36 claims
- 0396US8089056B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2009·Granted Jan 3, 2012·29 cites·20 claims
- 0484US8890094B2Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2013·Granted Nov 18, 2014·6 cites·19 claims
- 0571USRE44908EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2012·Granted May 27, 2014·1 cites·56 claims
- 0670US6844560B2Lithography system comprising a converter plate and means for protecting the converter plateMAPPER LITHOGRAPHY IP BV·Filed 2002·Granted Jan 18, 2005·10 cites·28 claims
- 0762USRE44240EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2008·Granted May 28, 2013·0 cites·131 claims
- 0857USRE45049EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2012·Granted Jul 29, 2014·0 cites·102 claims
- 0953US9105439B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2011·Granted Aug 11, 2015·0 cites·23 claims
- 1053US2009261267A1Projection lens arrangementMAPPER LITHOGRAPHY IP BV·Filed 2009·Application pending·0 cites
- 1136US2003178583A1Field emission photo-cathode array for lithography system and lithography system provided with such an arrayFiled 2003·Application pending·0 cites
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