Inventor · disambiguated record
Yong-Kyun Ko
Also filed as: KO YONG-KYUN
9 granted patents·6 pending applications·87 citations·filing 1996–2008
88Inventor score
Top patents by PatentIndex Score
15 records- 0180US6883248B2Apparatus for drying a substrate using an isopropyl alcohol vaporSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 26, 2005·26 cites·36 claims
- 0277US7100306B2Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Sep 5, 2006·4 cites·10 claims
- 0377US6959823B2Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 1, 2005·15 cites·5 claims
- 0469US7311857B2Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Dec 25, 2007·13 cites·3 claims
- 0561US6939410B2Apparatus and method for collecting impurities on a semiconductor waferSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Sep 6, 2005·11 cites·20 claims
- 0655US6905570B2Apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 14, 2005·5 cites·19 claims
- 0751US2006260149A1Wafer guides for processing semiconductor substratesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0844US6149731AValve cleaning methodSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Nov 21, 2000·9 cites·15 claims
- 0943US2007181160A1Supporter and apparatus for cleaning substrates with the supporter, and method for cleaning substratesSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1043US2004226186A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1141US2004010932A1Apparatus for drying semiconductor substrates using azeotrope effect and drying method using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
- 1239US2009117499A1Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solutionKIM SE-YEON·Filed 2008·Application pending·0 cites
- 1336US6137018AChemical refining method and reuse system for semiconductor device manufacturingSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Oct 24, 2000·1 cites·15 claims
- 1433US2007000523A1Cleaning composition and related methodsKIM SE-YEON·Filed 2006·Application pending·0 cites
- 1532US5948690APretreatment system for analyzing impurities contained in flat sampleSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Sep 7, 1999·3 cites·14 claims
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