Inventor · disambiguated record
Tsutae Omori
Also filed as: OMORI TSUTAE
21 granted patents·630 citations·filing 1994–2011
96Inventor score
Top patents by PatentIndex Score
21 records- 0195US5695817AMethod of forming a coating filmTOKYO ELECTRON LTD·Filed 1995·Granted Dec 9, 1997·92 cites·28 claims
- 0294US5803970AMethod of forming a coating film and coating apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Sep 8, 1998·82 cites·38 claims
- 0392US6709523B1Silylation treatment unit and methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 23, 2004·53 cites·14 claims
- 0489US5505781AHydrophobic processing apparatus including a liquid delivery systemTOKYO ELECTRON LTD·Filed 1994·Granted Apr 9, 1996·64 cites·11 claims
- 0588US6458208B1Film forming apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Oct 1, 2002·40 cites·5 claims
- 0684US6306455B1Substrate processing methodTOKYO ELECTRON LTD·Filed 1998·Granted Oct 23, 2001·65 cites·8 claims
- 0781US6491452B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·16 cites·3 claims
- 0879US6713239B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Mar 30, 2004·14 cites·10 claims
- 0976US6238848B1Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 29, 2001·12 cites·6 claims
- 1075US6165552AFilm forming methodTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·41 cites·9 claims
- 1171US5681614AHydrophobic treatment method involving delivery of a liquid process agent to a process spaceTOKYO ELECTRON LTD·Filed 1996·Granted Oct 28, 1997·31 cites·14 claims
- 1266US6635113B2Coating apparatus and coating methodTOKYO ELECTRON LTD·Filed 1999·Granted Oct 21, 2003·31 cites·6 claims
- 1366USD415184SApparatus for manufacturing a semiconductor for a liquid crystal displayTOKYO ELECTRON LTD·Filed 1998·Granted Oct 12, 1999·15 cites·1 claims
- 1463US6361600B1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 1999·Granted Mar 26, 2002·23 cites·19 claims
- 1562US6682777B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted Jan 27, 2004·7 cites·6 claims
- 1661US6872670B2Silylation treatment unit and methodTOKYO ELECTRON LTD·Filed 2004·Granted Mar 29, 2005·6 cites·6 claims
- 1758US6398429B1Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jun 4, 2002·12 cites·22 claims
- 1857US6706322B2Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2002·Granted Mar 16, 2004·4 cites·5 claims
- 1950US6203218B1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 1999·Granted Mar 20, 2001·17 cites·20 claims
- 2041USD415776SApparatus for manufacturing a semiconductor for a liquid crystal displayTOKYO ELECTRON LTD·Filed 1998·Granted Oct 26, 1999·5 cites·1 claims
- 2136US8741070B2Liquid processing method, liquid processing apparatus and recording mediumMIZUTANI NOBUTAKA·Filed 2011·Granted Jun 3, 2014·0 cites·7 claims
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