Inventor · disambiguated record
Joy Cheng
Also filed as: CHENG JOY · CHENG JOY JIE
77 granted patents·10 pending applications·847 citations·filing 2007–2025
99Inventor score
Top patents by PatentIndex Score
87 records- 0199US7521090B1Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin filmsIBM·Filed 2008·Granted Apr 21, 2009·158 cites·25 claims
- 0298US9576817B1Pattern decomposition for directed self assembly patterns templated by sidewall image transferIBM·Filed 2015·Granted Feb 21, 2017·40 cites·17 claims
- 0398US7521094B1Method of forming polymer features by directed self-assembly of block copolymersIBM·Filed 2008·Granted Apr 21, 2009·115 cites·1 claims
- 0497US10073347B1Semiconductor method of protecting wafer from bevel contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Sep 11, 2018·19 cites·20 claims
- 0597US9159558B2Methods of reducing defects in directed self-assembled structuresIBM·Filed 2013·Granted Oct 13, 2015·65 cites·34 claims
- 0697US8336003B2Method for designing optical lithography masks for directed self-assemblyCHENG JOY·Filed 2010·Granted Dec 18, 2012·37 cites·18 claims
- 0797US8226838B2Method of forming polymer features by directed self-assembly of block copolymersCHENG JOY·Filed 2008·Granted Jul 24, 2012·40 cites·25 claims
- 0897US8114306B2Method of forming sub-lithographic features using directed self-assembly of polymersCHENG JOY·Filed 2009·Granted Feb 14, 2012·73 cites·22 claims
- 0996US11054742B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 6, 2021·4 cites·20 claims
- 1096US10866511B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·10 cites·20 claims
- 1195US9458353B1Additives for orientation control of block copolymersIBM·Filed 2015·Granted Oct 4, 2016·8 cites·34 claims
- 1294US11681226B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 20, 2023·2 cites·20 claims
- 1394US11300878B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 12, 2022·6 cites·20 claims
- 1494US9812358B1FinFET structures and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·13 cites·20 claims
- 1594US8856693B2Method for designing optical lithography masks for directed self-assemblyCHENG JOY·Filed 2012·Granted Oct 7, 2014·14 cites·16 claims
- 1694US8828493B2Methods of directed self-assembly and layered structures formed therefromCHENG JOY·Filed 2009·Granted Sep 9, 2014·21 cites·24 claims
- 1793US11822238B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 21, 2023·2 cites·20 claims
- 1893US10515812B1Methods of reducing pattern roughness in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 24, 2019·6 cites·20 claims
- 1991US9107291B2Formation of a composite pattern including a periodic pattern self-aligned to a prepatternIBM·Filed 2012·Granted Aug 11, 2015·13 cites·26 claims
- 2091US8323868B2Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereofCHENG JOY·Filed 2009·Granted Dec 4, 2012·4 cites·19 claims
- 2190US12253800B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 18, 2025·1 cites·20 claims
- 2289US11427670B2Composition and processBOREALIS AG·Filed 2017·Granted Aug 30, 2022·4 cites·15 claims
- 2389US8727135B2Composite filtration membranes and methods of preparation thereofCHENG JOY·Filed 2010·Granted May 20, 2014·9 cites·34 claims
- 2489US8715917B2Simultaneous photoresist development and neutral polymer layer formationIBM·Filed 2012·Granted May 6, 2014·8 cites·20 claims
- 2589US8398868B2Directed self-assembly of block copolymers using segmented prepatternsCHENG JOY·Filed 2009·Granted Mar 19, 2013·14 cites·36 claims
- 2689US2024377735A1Euv metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2788US8734904B2Methods of forming topographical features using segregating polymer mixturesCHENG JOY·Filed 2010·Granted May 27, 2014·9 cites·36 claims
- 2888US8084193B2Self-segregating multilayer imaging stack with built-in antireflective propertiesCHENG JOY·Filed 2008·Granted Dec 27, 2011·11 cites·3 claims
- 2987US12360456B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 15, 2025·0 cites·20 claims
- 3087US12181798B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 3187US10866516B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 15, 2020·3 cites·20 claims
- 3287US10622211B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 14, 2020·4 cites·20 claims
- 3387US9879152B2Block copolymers for directed self-assembly applicationsIBM·Filed 2015·Granted Jan 30, 2018·2 cites·46 claims
- 3487US8821978B2Methods of directed self-assembly and layered structures formed therefromCHENG JOY·Filed 2009·Granted Sep 2, 2014·13 cites·29 claims
- 3587US8623458B2Methods of directed self-assembly, and layered structures formed therefromCHENG JOY·Filed 2009·Granted Jan 7, 2014·13 cites·34 claims
- 3686US9684236B1Method of patterning a film layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 20, 2017·4 cites·20 claims
- 3786US9441062B2Multimodal polyethylene polymers and methods of making and using the sameBOREALIS AG·Filed 2014·Granted Sep 13, 2016·5 cites·22 claims
- 3885US12210286B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 28, 2025·0 cites·20 claims
- 3985US9738765B2Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymersIBM·Filed 2015·Granted Aug 22, 2017·4 cites·31 claims
- 4085US7763319B2Method of controlling orientation of domains in block copolymer filmsIBM·Filed 2008·Granted Jul 27, 2010·18 cites·1 claims
- 4185US7651735B2Orienting, positioning, and forming nanoscale structuresIBM·Filed 2008·Granted Jan 26, 2010·13 cites·15 claims
- 4284US10059820B2Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymersIBM·Filed 2017·Granted Aug 28, 2018·3 cites·21 claims
- 4384US8491965B2Method of controlling orientation of domains in block copolymer filmsCHENG JOY·Filed 2008·Granted Jul 23, 2013·17 cites·15 claims
- 4483US10274847B2Humidity control in EUV lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·2 cites·20 claims
- 4583US9556353B2Orientation control materials for block copolymers used in directed self-assembly applicationsIBM·Filed 2014·Granted Jan 31, 2017·4 cites·27 claims
- 4683US7989026B2Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin filmsIBM·Filed 2008·Granted Aug 2, 2011·4 cites·1 claims
- 4783US2024377731A1Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4882US10741410B2Material composition and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 11, 2020·3 cites·20 claims
- 4982US9574107B2Fluoro-alcohol additives for orientation control of block copolymersIBM·Filed 2015·Granted Feb 21, 2017·3 cites·30 claims
- 5081US12012504B2Process for the preparation of multimodal high density polyethyleneBOREALIS AG·Filed 2019·Granted Jun 18, 2024·1 cites·16 claims
Showing the top 50 of 87 patent records by PatentIndex Score.
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