Inventor · disambiguated record
Suk-Hwan Chung
Also filed as: CHUNG SUK-HWAN
12 granted patents·3 pending applications·12 citations·filing 2001–2023
83Inventor score
Top patents by PatentIndex Score
15 records- 0177US7680163B2Laser irradiating method including maintaining temperature of a lensJAPAN STEEL WORKS LTD·Filed 2008·Granted Mar 16, 2010·6 cites·4 claims
- 0274US11810799B2Laser processing apparatus and laser processing methodJSW AKTINA SYSTEM CO LTD·Filed 2017·Granted Nov 7, 2023·2 cites·15 claims
- 0371US12136548B2Laser annealing apparatus, laser annealing method, and method for manufacturing semiconductor deviceJSW AKTINA SYSTEM CO LTD·Filed 2023·Granted Nov 5, 2024·0 cites·8 claims
- 0465US9245757B2Laser annealing treatment apparatus and laser annealing treatment methodSHIDA JUNICHI·Filed 2010·Granted Jan 26, 2016·3 cites·5 claims
- 0562US2021343531A1Laser annealing apparatus, inspection method of substrate with crystallized film, and manufacturing method of semiconductor deviceJAPAN STEEL WORKS LTD·Filed 2021·Application pending·0 cites
- 0661US7471712B2Laser irradiating method and device for sameJAPAN STEEL WORKS LTD·Filed 2006·Granted Dec 30, 2008·1 cites·7 claims
- 0760US11894229B2Laser annealing apparatus, laser annealing method, and method for manufacturing semiconductor deviceJSW AKTINA SYSTEM CO LTD·Filed 2021·Granted Feb 6, 2024·0 cites·5 claims
- 0853US11114300B2Laser annealing apparatus, inspection method of substrate with crystallized film, and manufacturing method of semiconductor deviceJAPAN STEEL WORKS LTD·Filed 2017·Granted Sep 7, 2021·0 cites·9 claims
- 0951US12491582B2Laser processing device and laser light monitoring methodJSW AKTINA SYSTEM CO LTD·Filed 2020·Granted Dec 9, 2025·0 cites·20 claims
- 1051US11842898B2Method for manufacturing panel using a glass substrate as the laser light transmitting member and laser processing apparatusJSW AKTINA SYSTEM CO LTD·Filed 2019·Granted Dec 12, 2023·0 cites·30 claims
- 1150US11992896B2Laser irradiation apparatus, laser irradiation method, and semiconductor device manufacturing methodJSW AKTINA SYSTEM CO LTD·Filed 2019·Granted May 28, 2024·0 cites·21 claims
- 1247US2023411159A1Laser irradiation apparatus and method of manufacturing semiconductor apparatusJAPAN STEEL WORKS LTD·Filed 2021·Application pending·0 cites
- 1338US11938563B2Annealed workpiece manufacturing method, laser anneal base stage, and laser anneal processing apparatusJSW AKTINA SYSTEM CO LTD·Filed 2017·Granted Mar 26, 2024·0 cites·5 claims
- 1437US11187953B2Laser processing apparatus, semiconductor device manufacturing method, and amorphous silicon crystallization methodJAPAN STEEL WORKS LTD·Filed 2017·Granted Nov 30, 2021·0 cites·18 claims
- 1531US2002175679A1Apparatus and method for measuring Hall effectFiled 2001·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →