Inventor · disambiguated record
Munirathna Padmanaban
Also filed as: PADMANABAN MUNIRATHNA
41 granted patents·14 pending applications·1,119 citations·filing 1994–2018
98Inventor score
Files withCLARIANT FINANCE BVI LTD10AZ ELECTRONIC MATERIALS USA8HOECHST JAPAN8PADMANABAN MUNIRATHNA7NAKASUGI SHIGEMASA3
Top patents by PatentIndex Score
55 records- 0198US6447980B1Photoresist composition for deep UV and process thereofCLARIANT FINANCE BVI LTD·Filed 2000·Granted Sep 10, 2002·144 cites·12 claims
- 0297US7678528B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Mar 16, 2010·34 cites·9 claims
- 0397US6723488B2Photoresist composition for deep UV radiation containing an additiveCLARIANT FINANCE BVI LTD·Filed 2001·Granted Apr 20, 2004·99 cites·13 claims
- 0496US6991888B2Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Jan 31, 2006·84 cites·19 claims
- 0594US7521170B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Apr 21, 2009·21 cites·8 claims
- 0693US7595141B2Composition for coating over a photoresist patternAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Sep 29, 2009·46 cites·12 claims
- 0791US6114085AAntireflective composition for a deep ultraviolet photoresistCLARIANT FINANCE BVI LTD·Filed 1998·Granted Sep 5, 2000·112 cites·17 claims
- 0889US9274426B2Antireflective coating compositions and processes thereofAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Granted Mar 1, 2016·12 cites·20 claims
- 0989US5525453APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1994·Granted Jun 11, 1996·61 cites·20 claims
- 1088US9315636B2Stable metal compounds, their compositions and methodsYAO HUIRONG·Filed 2012·Granted Apr 19, 2016·6 cites·22 claims
- 1188US6737492B2Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 2002·Granted May 18, 2004·28 cites·15 claims
- 1287US6803168B1Composition for anti-reflective coating or radiation absorbing coating and compounds used in the compositionCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 12, 2004·55 cites·27 claims
- 1384US8632948B2Positive-working photoimageable bottom antireflective coatingPADMANABAN MUNIRATHNA·Filed 2009·Granted Jan 21, 2014·9 cites·9 claims
- 1484US6277750B1Composition for bottom reflection preventive film and novel polymeric dye for use in the sameCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 21, 2001·48 cites·18 claims
- 1584US5663035ARadiation-sensitive mixture comprising a basic iodonium compoundHOECHST JAPAN·Filed 1995·Granted Sep 2, 1997·57 cites·16 claims
- 1681US8900797B2Developable bottom anti-reflective coatingNAKASUGI SHIGEMASA·Filed 2012·Granted Dec 2, 2014·4 cites·15 claims
- 1781US8623589B2Bottom antireflective coating compositions and processes thereofKUDO TAKANORI·Filed 2011·Granted Jan 7, 2014·5 cites·18 claims
- 1881US6610465B2Process for producing film forming resins for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 2001·Granted Aug 26, 2003·23 cites·53 claims
- 1980US9296922B2Stable metal compounds as hardmasks and filling materials, their compositions and methods of useYAO HUIRONG·Filed 2013·Granted Mar 29, 2016·5 cites·19 claims
- 2079US6329117B1Antireflection or light-absorbing coating composition and polymer thereforCLARIANT INT LTD·Filed 1998·Granted Dec 11, 2001·60 cites·26 claims
- 2176US6365322B1Photoresist composition for deep UV radiationCLARIANT FINANCE BVI LTD·Filed 1999·Granted Apr 2, 2002·34 cites·19 claims
- 2273US8697336B2Composition for forming a developable bottom antireflective coatingNAKASUGI SHIGEMASA·Filed 2011·Granted Apr 15, 2014·2 cites·14 claims
- 2373US5852128AAcid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materialsCLARIANT AG·Filed 1997·Granted Dec 22, 1998·31 cites·8 claims
- 2471US7833693B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2008·Granted Nov 16, 2010·1 cites·10 claims
- 2569US6800416B2Negative deep ultraviolet photoresistCLARIANT FINANCE BVI LTD·Filed 2002·Granted Oct 5, 2004·9 cites·9 claims
- 2668US9409793B2Spin coatable metallic hard mask compositions and processes thereofAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 9, 2016·2 cites·14 claims
- 2764US5595855ARadiation sensitive compositionHOECHST JAPAN·Filed 1995·Granted Jan 21, 1997·24 cites·18 claims
- 2862US7491482B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Feb 17, 2009·7 cites·4 claims
- 2959US7122291B2Photoresist compositionsAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Oct 17, 2006·15 cites·12 claims
- 3058US5843319APositive-working radiation-sensitive mixtureHOECHST JAPAN·Filed 1997·Granted Dec 1, 1998·16 cites·12 claims
- 3156US6468718B1Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coatingCLARIANT FINANCE BVI LTD·Filed 1999·Granted Oct 22, 2002·14 cites·10 claims
- 3256US5738972ARadiation sensitive compositionHOECHST JAPAN·Filed 1997·Granted Apr 14, 1998·21 cites·19 claims
- 3353US7537879B2Photoresist composition for deep UV and process thereofAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted May 26, 2009·3 cites·20 claims
- 3452US2014193753A1Composition for forming a developable bottom antireflective coatingNAKASUGI SHIGEMASA·Filed 2014·Application pending·0 cites
- 3551US2008035556A1Process for producing film forming resins for photoresist compositionsPADMANABAN MUNIRATHNA·Filed 2007·Application pending·0 cites
- 3648US9418836B2Polyoxometalate and heteropolyoxometalate compositions and methods for their useAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Aug 16, 2016·0 cites·5 claims
- 3747US5846690ARadiation-sensitive composition containing plasticizerHOECHST JAPAN·Filed 1996·Granted Dec 8, 1998·11 cites·14 claims
- 3846US11031237B2Aromatic amino siloxane functionalized materials for use in capping porous dielectricsMERCK PATENT GMBH·Filed 2018·Granted Jun 8, 2021·0 cites·9 claims
- 3944US2010136477A1Photosensitive CompositionNG EDWARD W·Filed 2008·Application pending·0 cites
- 4043US5773191ARadiation-sensitive compositionHOECHST JAPAN·Filed 1996·Granted Jun 30, 1998·11 cites·19 claims
- 4143US2015309403A1Antireflective coating compositions and processes thereofAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Application pending·0 cites
- 4243US2008171270A1Polymers Useful in Photoresist Compositions and Compositions ThereofPADMANABAN MUNIRATHNA·Filed 2007·Application pending·0 cites
- 4342US11421128B2Composition of spin-on materials containing metal oxide nanoparticles and an organic polymerRIDGEFIELD ACQUISITION·Filed 2017·Granted Aug 23, 2022·0 cites·31 claims
- 4442US2009042148A1Photoresist Composition for Deep UV and Process ThereofPADMANABAN MUNIRATHNA·Filed 2007·Application pending·0 cites
- 4541US2005271974A1Photoactive compoundsRAHMAN M D·Filed 2004·Application pending·0 cites
- 4641US2008187868A1Photoactive CompoundsPADMANABAN MUNIRATHNA·Filed 2007·Application pending·0 cites
- 4741US2011086312A1Positive-Working Photoimageable Bottom Antireflective CoatingDAMMEL RALPH R·Filed 2009·Application pending·0 cites
- 4840US2006102554A1Process for producing film forming resins for photoresist compositionsPADMANABAN MUNIRATHNA·Filed 2004·Application pending·0 cites
- 4939US5641594AColored, photosensitive resin compositionHOECHST JAPAN·Filed 1994·Granted Jun 24, 1997·5 cites·18 claims
- 5038US8252503B2Photoresist compositionsCHAKRAPANI SRINIVASAN·Filed 2007·Granted Aug 28, 2012·0 cites·7 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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